Threshold Damage of Al film by 248 nm KrF Excimer Laser
碩士 === 國立中央大學 === 化學工程與材料工程研究所 === 96 === We estimate feasibility and life time of Al metal mask that applied to technology of etching and Laser Writing. According to coating layer of metal mask that have high characteristics of resisting laser ability, we compare Al film that have high reflectivity...
Main Authors: | Han-chun Tsao, 曹漢君 |
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Other Authors: | Cheng-Yi Liu |
Format: | Others |
Language: | zh-TW |
Published: |
2008
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Online Access: | http://ndltd.ncl.edu.tw/handle/02255568783094025112 |
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