Characterization of Erbium-doped ZnO prepared by Ion beam sputtering deposition
碩士 === 國立臺灣科技大學 === 電子工程系 === 96 === Erbium-doped ZnO films were deposited by ion-beam sputtering deposition. Alternate ZnO-Er layers were deposited on Si wafers utilizing individual ZnO and Er targets. This allows the mixing of Er into ZnO matrixes by thermal annealing. Under above bandgap excitati...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/03341268133404057871 |