Application of Phase-Shift Interference for Measuring Line-Width in Mirco-Nanometer Scale

• Main Authors: Jyun-Yu Liou, 劉俊余
• Other Authors: none
• Format: Others
• Language: zh-TW
• Published: 2008
• Online Access: http://ndltd.ncl.edu.tw/handle/23948050097481063993

碩士 === 國立臺灣科技大學 === 機械工程系 === 96 === An optical interference system incorporating a microscope and a piezoelectric actuator was developed to measure line-width of the step in micro-nanometer scale. Application of phase-shift techniques for measurement in flatness is common. However, it is not easy to carry on for measuring the step height in sub-micrometer scale. Associating with the computer imaging processing system, the Four-Frame Technique was used to reconstruct the phase height of the object. The experimental data were compared with Scanning Electron Microscope. The results show the method of phase-shift interference is acceptable in vertical height measurement, however, in lateral measurement it is influenced by the diffraction effect. Although it will be influenced by the diffraction, it’s resolution is better than the limitation of Rayleigh’s criterion. Also, in this paper, it is proved that the resolution of TM polarized light is superior than that of TE polarized light in measuring lateral width.