| Summary: | 碩士 === 東海大學 === 環境科學與工程學系 === 96 === The expansion of high-tech industry is the way to upgrade the product value in many developing countries. In Taiwan, there are several science-based industrial parks, which generate tremendous high value-added export products, meanwhile they also may emit toxic substances into both air and water bodies. Arsenic, cadmium and lead are commonly found in the ambient air near industrial parks. This study conducted a survey program, between Dec. 2005 and Feb. 2007, at the central Taiwan science park (CTSP). Since the CTSP is under construction during the initial sampling period, therefore, the investigate data may cover the pollution before and after the operation of it. The types of CTSP industry include flat glass, aerospace, precision machinery, optoelectronics, semiconductor and other strategic research and development laboratories. This project allocates the sampling sites which cover the upstream and downstream of the emission sources according to the wind direction. The atmospheric particulate is collected through a high volume air samplers with quartz filter under the initial air flow rate of 200 L min-1 for 24 hours. The digested filter samples were analyzed by either flame or graphite type furnace of atomic absorption spectrophotometer. Eleven elements, arsenic, iron, manganese, copper, cadmium, calcium, zinc, lead, magnesium, nickel and chromium, were included in this study. The principal component analysis (PCA) method, Gaussian dispersion model and The Air Pollution Model (TAPM) were adapted to simulate the heavy metal dispersion phenomena. The results indicate the ambient level of arsenic before and after the operation of CTSP are 1.4 ng m-3 and 11.1±9.2 ng m-3 respectively. The ambient arsenic level in downstream of CTSP is significantly higher than that of upstream based on the wind direction. According to PCA analysis, it points out several potential pollutants which located in this site. A comprehensive sampling program, under high NE wind case with 4 sampling sites run in series, proven the serious As pollution facts and provide variable data to trace back the pollution sources. The Gaussian dispersion model can estimate the theoretical amount of arsenic discharge in the sampling area and provide an acceptable amount of discharge for the pollution reduction purpose based upon the risk analysis data base. The simulation results from TAPM model identify the sampling result during NE bound wind’s case are correct. It also can apply to predict the optima sampling sites based on the on-site climate information. The flat glass, optoelectronics and semiconductor industries are assumed to be the high potential emission sources of arsenic. The findings also can offer a strategy to allocate the optima sampling program according to the Gaussian and TAPM. However, the possible pollution contributors, in this specific case, still need more information to either collection long term data and identify the potential pollution sources.
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