Prepare CuIn1-xGaxSe2 thin films by sputtering and electroplating

碩士 === 國防大學理工學院 === 材料科學碩士班 === 97 === Two different methods, sputtering and electroplating, were used to prepare CuIn1-xGaxSe2 thin films, which act as the main absorber layer of copper-indium-gallium-diselenide (CIGS) thin film solar cells, in this thesis. The surface morphology, constituents comp...

Full description

Bibliographic Details
Main Authors: Hsiu-Min, Lin, 林修民
Other Authors: Yih-Ming, Liu
Format: Others
Language:zh-TW
Published: 2009
Online Access:http://ndltd.ncl.edu.tw/handle/62287040998242024906
id ndltd-TW-097CCIT0159003
record_format oai_dc
spelling ndltd-TW-097CCIT01590032015-11-20T04:18:29Z http://ndltd.ncl.edu.tw/handle/62287040998242024906 Prepare CuIn1-xGaxSe2 thin films by sputtering and electroplating 濺鍍及電鍍法製作銅銦鎵硒薄膜研究 Hsiu-Min, Lin 林修民 碩士 國防大學理工學院 材料科學碩士班 97 Two different methods, sputtering and electroplating, were used to prepare CuIn1-xGaxSe2 thin films, which act as the main absorber layer of copper-indium-gallium-diselenide (CIGS) thin film solar cells, in this thesis. The surface morphology, constituents composition, crystallinity, and electrical properties of these CIGS thin films were analyzed. For the sputtering process, we focus on the preparation of sputtering targets made of the ternary compound alloy, copper-indium-gallium (Cu-In-Ga, CIG). The manufacturing process used vacuum arc melting (VAM) to make the alloy targets with different constituents compositions. The compositions of the targets were analyzed in order to study the relation between the initial ingredients and the final alloy compositions. In addition, these targets were used for sputtering CIG thin films. And by selenizing these CIG precursors, CIGS thin films were fabricated. Finally the composition, microstructure, and electrical properties of CIGS thin films were analyzed. The results revealed that, VAM process could prepare ternary compound alloy target, but the composition is different from original proportion of individual elements. By varying the VAM parameters, one could make alloys with controlled composition and quality. Using these alloys as sputtering targets, CIG precursors were deposited, and after a selenization heat treatment, CIGS thin films containing CuIn0.7Ga0.3Se2 chalcopyrite phase were successfully fabricated. For the electrodeposition process, the research used an equipment for alloy electrodeposition to directly deposit the CIGS thin films on carbon steel and indium-tin-oxide (ITO) glass substrates. We tried to find out the appropriate operating parameters and recipe for plating solution. The results revealed that, with carbon steel, by properly adjusting the electroplating solution, the composition of deposited CIGS thin films was already close to ideal proportion (Cu:In:Ga:Se = 25:17.5:7.5:50). The electrodeposition parameters and constituent compositions of CIGS thin film may change when ITO glass substrates were used instead of carbon steel. The results showed that, for the pH values between 1.5 and 1.7, one could more easily control the composition of deposited films. Also, by varying the composition of electroplating solution, the CIGS thin films already approached ideal composition (Cu:In:Ga:Se = 25:17.5:7.5:50). Finally, a heat treatment in Se vapor could greatly improve the crystalline phase of CIGS thin films. Yih-Ming, Liu Nen-Wen, Pu Yann Cheng, Chen Hui-Yun, Bor 劉益銘 蒲念文 陳彥政 薄慧雲 2009 學位論文 ; thesis 161 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國防大學理工學院 === 材料科學碩士班 === 97 === Two different methods, sputtering and electroplating, were used to prepare CuIn1-xGaxSe2 thin films, which act as the main absorber layer of copper-indium-gallium-diselenide (CIGS) thin film solar cells, in this thesis. The surface morphology, constituents composition, crystallinity, and electrical properties of these CIGS thin films were analyzed. For the sputtering process, we focus on the preparation of sputtering targets made of the ternary compound alloy, copper-indium-gallium (Cu-In-Ga, CIG). The manufacturing process used vacuum arc melting (VAM) to make the alloy targets with different constituents compositions. The compositions of the targets were analyzed in order to study the relation between the initial ingredients and the final alloy compositions. In addition, these targets were used for sputtering CIG thin films. And by selenizing these CIG precursors, CIGS thin films were fabricated. Finally the composition, microstructure, and electrical properties of CIGS thin films were analyzed. The results revealed that, VAM process could prepare ternary compound alloy target, but the composition is different from original proportion of individual elements. By varying the VAM parameters, one could make alloys with controlled composition and quality. Using these alloys as sputtering targets, CIG precursors were deposited, and after a selenization heat treatment, CIGS thin films containing CuIn0.7Ga0.3Se2 chalcopyrite phase were successfully fabricated. For the electrodeposition process, the research used an equipment for alloy electrodeposition to directly deposit the CIGS thin films on carbon steel and indium-tin-oxide (ITO) glass substrates. We tried to find out the appropriate operating parameters and recipe for plating solution. The results revealed that, with carbon steel, by properly adjusting the electroplating solution, the composition of deposited CIGS thin films was already close to ideal proportion (Cu:In:Ga:Se = 25:17.5:7.5:50). The electrodeposition parameters and constituent compositions of CIGS thin film may change when ITO glass substrates were used instead of carbon steel. The results showed that, for the pH values between 1.5 and 1.7, one could more easily control the composition of deposited films. Also, by varying the composition of electroplating solution, the CIGS thin films already approached ideal composition (Cu:In:Ga:Se = 25:17.5:7.5:50). Finally, a heat treatment in Se vapor could greatly improve the crystalline phase of CIGS thin films.
author2 Yih-Ming, Liu
author_facet Yih-Ming, Liu
Hsiu-Min, Lin
林修民
author Hsiu-Min, Lin
林修民
spellingShingle Hsiu-Min, Lin
林修民
Prepare CuIn1-xGaxSe2 thin films by sputtering and electroplating
author_sort Hsiu-Min, Lin
title Prepare CuIn1-xGaxSe2 thin films by sputtering and electroplating
title_short Prepare CuIn1-xGaxSe2 thin films by sputtering and electroplating
title_full Prepare CuIn1-xGaxSe2 thin films by sputtering and electroplating
title_fullStr Prepare CuIn1-xGaxSe2 thin films by sputtering and electroplating
title_full_unstemmed Prepare CuIn1-xGaxSe2 thin films by sputtering and electroplating
title_sort prepare cuin1-xgaxse2 thin films by sputtering and electroplating
publishDate 2009
url http://ndltd.ncl.edu.tw/handle/62287040998242024906
work_keys_str_mv AT hsiuminlin preparecuin1xgaxse2thinfilmsbysputteringandelectroplating
AT línxiūmín preparecuin1xgaxse2thinfilmsbysputteringandelectroplating
AT hsiuminlin jiàndùjídiàndùfǎzhìzuòtóngyīnjiāxībáomóyánjiū
AT línxiūmín jiàndùjídiàndùfǎzhìzuòtóngyīnjiāxībáomóyánjiū
_version_ 1718131486914248704