The Application of Nano-particles of Silicon Dioxide by Sol-Gel process on Light Emitting Diode roughness

碩士 === 中原大學 === 化學工程研究所 === 97 === In this study, we synthesize a variety of sizes of SiO2 nano-spheres from TEOS, the precursor, with varied ratio of Ammonia Aqua by the Sol-Gel method. The sizes and the distribution of SiO2 nano-spheres on LED-Epitaxy Wafer are observed by Scanning Electron Micros...

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Main Authors: LAN-YANG YA, 楊雅蘭
Other Authors: Tsair-Wang Chung
Format: Others
Language:zh-TW
Published: 2009
Online Access:http://ndltd.ncl.edu.tw/handle/95639287122732391719
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spelling ndltd-TW-097CYCU50620042015-10-13T14:53:13Z http://ndltd.ncl.edu.tw/handle/95639287122732391719 The Application of Nano-particles of Silicon Dioxide by Sol-Gel process on Light Emitting Diode roughness 以溶膠-凝膠法製備二氧化矽應用於發光二極體表面粗化之研究 LAN-YANG YA 楊雅蘭 碩士 中原大學 化學工程研究所 97 In this study, we synthesize a variety of sizes of SiO2 nano-spheres from TEOS, the precursor, with varied ratio of Ammonia Aqua by the Sol-Gel method. The sizes and the distribution of SiO2 nano-spheres on LED-Epitaxy Wafer are observed by Scanning Electron Microscopy (SEM) and Particle Analyzer. Further, we apply SiO2 nano-spheres as a hard mask to obtain patterned and roughing wafer surface by which the light extraction efficiency increases. For the roughen experiment investigation, we consider several parametric factors with the help of SAS software, and we obtain the optimal value of the model established by the response curve method. Those parametric factors are sphere dimension, 180~500nm, spin-coated rotation speed, 500~3500rpm, and etching depth, 60~300nm, respectively. And their target function is the axial luminous intensity. From the response curve method, all these three factors possess phenomenal degree of influence on the axial luminous intensity. The optimized value of the luminous intensity from calculation is 120.76mcd while these values, 409nm, 500rpm, and 234nm are being designated for the three corresponding factors. The experimental value of the luminous intensity on average is 121mcd with the standard deviation of 2.94mcd while the designated values are being used. Under the optimized roughen condition, the light extraction efficiency increases up to 25% in comparison with non-roughen LED sample. Tsair-Wang Chung 鍾財王 2009 學位論文 ; thesis 84 zh-TW
collection NDLTD
language zh-TW
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description 碩士 === 中原大學 === 化學工程研究所 === 97 === In this study, we synthesize a variety of sizes of SiO2 nano-spheres from TEOS, the precursor, with varied ratio of Ammonia Aqua by the Sol-Gel method. The sizes and the distribution of SiO2 nano-spheres on LED-Epitaxy Wafer are observed by Scanning Electron Microscopy (SEM) and Particle Analyzer. Further, we apply SiO2 nano-spheres as a hard mask to obtain patterned and roughing wafer surface by which the light extraction efficiency increases. For the roughen experiment investigation, we consider several parametric factors with the help of SAS software, and we obtain the optimal value of the model established by the response curve method. Those parametric factors are sphere dimension, 180~500nm, spin-coated rotation speed, 500~3500rpm, and etching depth, 60~300nm, respectively. And their target function is the axial luminous intensity. From the response curve method, all these three factors possess phenomenal degree of influence on the axial luminous intensity. The optimized value of the luminous intensity from calculation is 120.76mcd while these values, 409nm, 500rpm, and 234nm are being designated for the three corresponding factors. The experimental value of the luminous intensity on average is 121mcd with the standard deviation of 2.94mcd while the designated values are being used. Under the optimized roughen condition, the light extraction efficiency increases up to 25% in comparison with non-roughen LED sample.
author2 Tsair-Wang Chung
author_facet Tsair-Wang Chung
LAN-YANG YA
楊雅蘭
author LAN-YANG YA
楊雅蘭
spellingShingle LAN-YANG YA
楊雅蘭
The Application of Nano-particles of Silicon Dioxide by Sol-Gel process on Light Emitting Diode roughness
author_sort LAN-YANG YA
title The Application of Nano-particles of Silicon Dioxide by Sol-Gel process on Light Emitting Diode roughness
title_short The Application of Nano-particles of Silicon Dioxide by Sol-Gel process on Light Emitting Diode roughness
title_full The Application of Nano-particles of Silicon Dioxide by Sol-Gel process on Light Emitting Diode roughness
title_fullStr The Application of Nano-particles of Silicon Dioxide by Sol-Gel process on Light Emitting Diode roughness
title_full_unstemmed The Application of Nano-particles of Silicon Dioxide by Sol-Gel process on Light Emitting Diode roughness
title_sort application of nano-particles of silicon dioxide by sol-gel process on light emitting diode roughness
publishDate 2009
url http://ndltd.ncl.edu.tw/handle/95639287122732391719
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