Characterization of TaOxNy-Ag composite thin films prepared by reactive magnetron sputtering
碩士 === 明志科技大學 === 化工與材料工程研究所 === 97 === TaOxNy and TaON-Ag composite films were deposited by reactive co-sputtering on Si and quartz glass substrates. The films were then annealed using RTA (Rapid Thermal Annealing) from 500℃~800℃ for 5 minutes respectively to induce the microstructural, optical pro...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/21342765666339117077 |