Study on the Photoelectrochemical Etching of Intrinsic Gallium Nitride
碩士 === 國立中興大學 === 電機工程學系所 === 97 === In the essay, we have researched many etched method of GaN. We chose the way of electrodeless photoelectrochemical etching with a chopped UV source to conduct the etching frame design and experiment, we hope we can apply this method on large area GaN chips making...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Online Access: | http://ndltd.ncl.edu.tw/handle/20860949570432627132 |