Mechanical Evaluation on Pattern Formation and Web Transportation for Next Generation Roll-to-Roll(R2R)Nanoimprinting Process

• Main Authors: Jhe-hao Syu, 許哲豪
• Other Authors: Kuo-Shen Chen
• Format: Others
• Language: zh-TW
• Published: 2009
• Online Access: http://ndltd.ncl.edu.tw/handle/67513018890239137691

碩士 === 國立成功大學 === 奈米科技暨微系統工程研究所 === 97 === Roll-to-Roll (R2R) nanoimprinting technique has already demonstrated its potential in manufacturing of soft electronics related products. However, the filling and web transportation performances of R2R nanoimprinting depends on many mechanical parameters and their effects must be evaluated for system optimization and device integrity considerations. During a typical web transportation process, a pre-applied tensile stress is required for overcoming possible compressive buckling failure due to geometrical misalignments. As a result, the relationship between the minimum required pre-tensile, geometrical misalignments, and materical properties, must be clarified. In this dissertation, the filling and web transportation performances of R2R nanoimprinting are investigated by both experiment and finite element analysis for the V shape pattern and the preliminary results are demonstrated. In this work the main experiment parameters are web tension, transportation speed, and pattern size. On the other hand, in filling simulation, the studies are focused on viscosity of UV curable resin and pattern size. The results would be important for process optimization and the system re-design for next generation R2R nanoimprinting machines.