Investigation on the Structure-Property Relationship of Nano-Clustering Silica (NCS) Porous Low-k Thin Films

碩士 === 國立交通大學 === 材料科學與工程系所 === 97 === The structure-property relationship of nano-clustering silica (NCS) porous low-k films (k ~2.8 to 2.0) was investigated by controlling silica matrix TEOS/MTMS ratio and structure directing agent or also acted as pore generator TPAOH concentration. Emphasize had...

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Bibliographic Details
Main Authors: Chuang, Shindy, 莊茹媖
Other Authors: Leu, Jih-Perng
Format: Others
Language:en_US
Published: 2009
Online Access:http://ndltd.ncl.edu.tw/handle/33139452092938359735