The Investigation of Metal-Insulator-Metal Capacitor Applying High-k Dielectrics Material
博士 === 國立交通大學 === 電子工程系所 === 97 === According to International Technology Roadmap for Semiconductor (ITRS), continuous increasing the capacitance density is required to scale down the device size and the cost of Metal-Insulator-Metal (MIM) capacitors which are widely for Analog, RF and DRAM function...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/66095805506307248591 |