Characteristics of Nonvolatile Memory Effect with Ir Nanocrystals in Asymmetric Tunnel Barriers
碩士 === 國立交通大學 === 奈米科技研究所 === 97 === Recently, nonvolatile memory with nanocrystals (NCs) has been widely studied to overcome limitations of conventional floating gate memory. The use of NCs as distributed floating gates minimized the problems of charge loss encountered in conventional floating-gate...
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ndltd-TW-097NCTU57950182015-10-13T15:42:33Z http://ndltd.ncl.edu.tw/handle/65419018067446582770 Characteristics of Nonvolatile Memory Effect with Ir Nanocrystals in Asymmetric Tunnel Barriers 銥奈米晶體於非對稱穿隧能障結構之非揮發記憶特性研究 Chen, Chao-Jui 陳昭睿 碩士 國立交通大學 奈米科技研究所 97 Recently, nonvolatile memory with nanocrystals (NCs) has been widely studied to overcome limitations of conventional floating gate memory. The use of NCs as distributed floating gates minimized the problems of charge loss encountered in conventional floating-gate devices, allowing thinner tunnel oxide and, thereby, a lower operating voltage, better endurance and retention, and faster program/erase (P/E) speed. Compared to the semiconductor NCs, metallic NCs as floating gates possesses several advantages, such as larger change of electric capacity, stronger coupling with the conduction channel, a wide range of available work functions, higher density of states around the Fermi level, and a smaller energy perturbation due to carrier confinement. In this thesis, it used the difference between asymmetric tunnel barrier (ATB) and a single layer structure. Both compared operating voltage and endurance. It can take the better tradeoff between the programming/erasing and retention characteristic by ATB structure. And Iridium has high work function and good thermal stability, we can demonstrate Iridium nanocrystals embedded in different tunneling oxide layer for capacitor characteristic and find different nanocrystals’ diameter and density. At the same operating voltage(+/-5 V), ATB(SiO2/Si3N4) structure ΔVFB ≒4.2 V and single layer(SiO2) structure ΔVFB ≒1.5 V. Each Ir-NCs stored 4 electrons or holes in ATB structure decive and 2 electrons or holes in single-layer structure device. The charge remaining of ATB memory device was 50% at 104 s, and 55% for single-layer memory device. Although, there is no improvement in data retention ATB device do lower the operating voltage and increase higher P/E speed. Sheu, Jeng-Tzong 許鉦宗 2009 學位論文 ; thesis 58 zh-TW |
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碩士 === 國立交通大學 === 奈米科技研究所 === 97 === Recently, nonvolatile memory with nanocrystals (NCs) has been widely studied to overcome limitations of conventional floating gate memory. The use of NCs as distributed floating gates minimized the problems of charge loss encountered in conventional floating-gate devices, allowing thinner tunnel oxide and, thereby, a lower operating voltage, better endurance and retention, and faster program/erase (P/E) speed.
Compared to the semiconductor NCs, metallic NCs as floating gates possesses several advantages, such as larger change of electric capacity, stronger coupling with the conduction channel, a wide range of available work functions, higher density of states around the Fermi level, and a smaller energy perturbation due to carrier confinement.
In this thesis, it used the difference between asymmetric tunnel barrier (ATB) and a single layer structure. Both compared operating voltage and endurance. It can take the better tradeoff between the programming/erasing and retention characteristic by ATB structure. And Iridium has high work function and good thermal stability, we can demonstrate Iridium nanocrystals embedded in different tunneling oxide layer for capacitor characteristic and find different nanocrystals’ diameter and density. At the same operating voltage(+/-5 V), ATB(SiO2/Si3N4) structure ΔVFB ≒4.2 V and single layer(SiO2) structure ΔVFB ≒1.5 V. Each Ir-NCs stored 4 electrons or holes in ATB structure decive and 2 electrons or holes in single-layer structure device. The charge remaining of ATB memory device was 50% at 104 s, and 55% for single-layer memory device. Although, there is no improvement in data retention ATB device do lower the operating voltage and increase higher P/E speed.
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author2 |
Sheu, Jeng-Tzong |
author_facet |
Sheu, Jeng-Tzong Chen, Chao-Jui 陳昭睿 |
author |
Chen, Chao-Jui 陳昭睿 |
spellingShingle |
Chen, Chao-Jui 陳昭睿 Characteristics of Nonvolatile Memory Effect with Ir Nanocrystals in Asymmetric Tunnel Barriers |
author_sort |
Chen, Chao-Jui |
title |
Characteristics of Nonvolatile Memory Effect with Ir Nanocrystals in Asymmetric Tunnel Barriers |
title_short |
Characteristics of Nonvolatile Memory Effect with Ir Nanocrystals in Asymmetric Tunnel Barriers |
title_full |
Characteristics of Nonvolatile Memory Effect with Ir Nanocrystals in Asymmetric Tunnel Barriers |
title_fullStr |
Characteristics of Nonvolatile Memory Effect with Ir Nanocrystals in Asymmetric Tunnel Barriers |
title_full_unstemmed |
Characteristics of Nonvolatile Memory Effect with Ir Nanocrystals in Asymmetric Tunnel Barriers |
title_sort |
characteristics of nonvolatile memory effect with ir nanocrystals in asymmetric tunnel barriers |
publishDate |
2009 |
url |
http://ndltd.ncl.edu.tw/handle/65419018067446582770 |
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