Characteristics of Nonvolatile Memory Effect with Ir Nanocrystals in Asymmetric Tunnel Barriers

碩士 === 國立交通大學 === 奈米科技研究所 === 97 === Recently, nonvolatile memory with nanocrystals (NCs) has been widely studied to overcome limitations of conventional floating gate memory. The use of NCs as distributed floating gates minimized the problems of charge loss encountered in conventional floating-gate...

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Main Authors: Chen, Chao-Jui, 陳昭睿
Other Authors: Sheu, Jeng-Tzong
Format: Others
Language:zh-TW
Published: 2009
Online Access:http://ndltd.ncl.edu.tw/handle/65419018067446582770
id ndltd-TW-097NCTU5795018
record_format oai_dc
spelling ndltd-TW-097NCTU57950182015-10-13T15:42:33Z http://ndltd.ncl.edu.tw/handle/65419018067446582770 Characteristics of Nonvolatile Memory Effect with Ir Nanocrystals in Asymmetric Tunnel Barriers 銥奈米晶體於非對稱穿隧能障結構之非揮發記憶特性研究 Chen, Chao-Jui 陳昭睿 碩士 國立交通大學 奈米科技研究所 97 Recently, nonvolatile memory with nanocrystals (NCs) has been widely studied to overcome limitations of conventional floating gate memory. The use of NCs as distributed floating gates minimized the problems of charge loss encountered in conventional floating-gate devices, allowing thinner tunnel oxide and, thereby, a lower operating voltage, better endurance and retention, and faster program/erase (P/E) speed. Compared to the semiconductor NCs, metallic NCs as floating gates possesses several advantages, such as larger change of electric capacity, stronger coupling with the conduction channel, a wide range of available work functions, higher density of states around the Fermi level, and a smaller energy perturbation due to carrier confinement. In this thesis, it used the difference between asymmetric tunnel barrier (ATB) and a single layer structure. Both compared operating voltage and endurance. It can take the better tradeoff between the programming/erasing and retention characteristic by ATB structure. And Iridium has high work function and good thermal stability, we can demonstrate Iridium nanocrystals embedded in different tunneling oxide layer for capacitor characteristic and find different nanocrystals’ diameter and density. At the same operating voltage(+/-5 V), ATB(SiO2/Si3N4) structure ΔVFB ≒4.2 V and single layer(SiO2) structure ΔVFB ≒1.5 V. Each Ir-NCs stored 4 electrons or holes in ATB structure decive and 2 electrons or holes in single-layer structure device. The charge remaining of ATB memory device was 50% at 104 s, and 55% for single-layer memory device. Although, there is no improvement in data retention ATB device do lower the operating voltage and increase higher P/E speed. Sheu, Jeng-Tzong 許鉦宗 2009 學位論文 ; thesis 58 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立交通大學 === 奈米科技研究所 === 97 === Recently, nonvolatile memory with nanocrystals (NCs) has been widely studied to overcome limitations of conventional floating gate memory. The use of NCs as distributed floating gates minimized the problems of charge loss encountered in conventional floating-gate devices, allowing thinner tunnel oxide and, thereby, a lower operating voltage, better endurance and retention, and faster program/erase (P/E) speed. Compared to the semiconductor NCs, metallic NCs as floating gates possesses several advantages, such as larger change of electric capacity, stronger coupling with the conduction channel, a wide range of available work functions, higher density of states around the Fermi level, and a smaller energy perturbation due to carrier confinement. In this thesis, it used the difference between asymmetric tunnel barrier (ATB) and a single layer structure. Both compared operating voltage and endurance. It can take the better tradeoff between the programming/erasing and retention characteristic by ATB structure. And Iridium has high work function and good thermal stability, we can demonstrate Iridium nanocrystals embedded in different tunneling oxide layer for capacitor characteristic and find different nanocrystals’ diameter and density. At the same operating voltage(+/-5 V), ATB(SiO2/Si3N4) structure ΔVFB ≒4.2 V and single layer(SiO2) structure ΔVFB ≒1.5 V. Each Ir-NCs stored 4 electrons or holes in ATB structure decive and 2 electrons or holes in single-layer structure device. The charge remaining of ATB memory device was 50% at 104 s, and 55% for single-layer memory device. Although, there is no improvement in data retention ATB device do lower the operating voltage and increase higher P/E speed.
author2 Sheu, Jeng-Tzong
author_facet Sheu, Jeng-Tzong
Chen, Chao-Jui
陳昭睿
author Chen, Chao-Jui
陳昭睿
spellingShingle Chen, Chao-Jui
陳昭睿
Characteristics of Nonvolatile Memory Effect with Ir Nanocrystals in Asymmetric Tunnel Barriers
author_sort Chen, Chao-Jui
title Characteristics of Nonvolatile Memory Effect with Ir Nanocrystals in Asymmetric Tunnel Barriers
title_short Characteristics of Nonvolatile Memory Effect with Ir Nanocrystals in Asymmetric Tunnel Barriers
title_full Characteristics of Nonvolatile Memory Effect with Ir Nanocrystals in Asymmetric Tunnel Barriers
title_fullStr Characteristics of Nonvolatile Memory Effect with Ir Nanocrystals in Asymmetric Tunnel Barriers
title_full_unstemmed Characteristics of Nonvolatile Memory Effect with Ir Nanocrystals in Asymmetric Tunnel Barriers
title_sort characteristics of nonvolatile memory effect with ir nanocrystals in asymmetric tunnel barriers
publishDate 2009
url http://ndltd.ncl.edu.tw/handle/65419018067446582770
work_keys_str_mv AT chenchaojui characteristicsofnonvolatilememoryeffectwithirnanocrystalsinasymmetrictunnelbarriers
AT chénzhāoruì characteristicsofnonvolatilememoryeffectwithirnanocrystalsinasymmetrictunnelbarriers
AT chenchaojui yīnàimǐjīngtǐyúfēiduìchēngchuānsuìnéngzhàngjiégòuzhīfēihuīfājìyìtèxìngyánjiū
AT chénzhāoruì yīnàimǐjīngtǐyúfēiduìchēngchuānsuìnéngzhàngjiégòuzhīfēihuīfājìyìtèxìngyánjiū
_version_ 1717768507714699264