Improvement of Thermal Stability via N2/H2 and D2O Radical-annealing Treatment in Atomic Layer Deposition of HfO2 Gate Oxide

Improvement of Thermal Stability via N2/H2 and D2O Radical-annealing Treatment in Atomic Layer Deposition of HfO2 Gate Oxide

碩士 === 國立清華大學 === 材料科學工程學系 === 97 ===

Bibliographic Details
Main Authors: Lin, Ming-Ho, 林民和
Other Authors: Wu, Tai-Bor
Format: Others
Language:zh-TW
Published: 2009
Online Access:http://ndltd.ncl.edu.tw/handle/70295487671029909093
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spelling ndltd-TW-097NTHU51590442015-11-13T04:08:48Z http://ndltd.ncl.edu.tw/handle/70295487671029909093 Improvement of Thermal Stability via N2/H2 and D2O Radical-annealing Treatment in Atomic Layer Deposition of HfO2 Gate Oxide 利用氮氫和水氣電漿處理改善原子層化學氣相沉積HfO2高介電閘極氧化薄膜之熱穩定性 Lin, Ming-Ho 林民和 碩士 國立清華大學 材料科學工程學系 97 Wu, Tai-Bor Gan, Jon-Yiew 吳泰伯 甘炯耀 2009 學位論文 ; thesis 98 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立清華大學 === 材料科學工程學系 === 97 ===
author2 Wu, Tai-Bor
author_facet Wu, Tai-Bor
Lin, Ming-Ho
林民和
author Lin, Ming-Ho
林民和
spellingShingle Lin, Ming-Ho
林民和
Improvement of Thermal Stability via N2/H2 and D2O Radical-annealing Treatment in Atomic Layer Deposition of HfO2 Gate Oxide
author_sort Lin, Ming-Ho
title Improvement of Thermal Stability via N2/H2 and D2O Radical-annealing Treatment in Atomic Layer Deposition of HfO2 Gate Oxide
title_short Improvement of Thermal Stability via N2/H2 and D2O Radical-annealing Treatment in Atomic Layer Deposition of HfO2 Gate Oxide
title_full Improvement of Thermal Stability via N2/H2 and D2O Radical-annealing Treatment in Atomic Layer Deposition of HfO2 Gate Oxide
title_fullStr Improvement of Thermal Stability via N2/H2 and D2O Radical-annealing Treatment in Atomic Layer Deposition of HfO2 Gate Oxide
title_full_unstemmed Improvement of Thermal Stability via N2/H2 and D2O Radical-annealing Treatment in Atomic Layer Deposition of HfO2 Gate Oxide
title_sort improvement of thermal stability via n2/h2 and d2o radical-annealing treatment in atomic layer deposition of hfo2 gate oxide
publishDate 2009
url http://ndltd.ncl.edu.tw/handle/70295487671029909093
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AT línmínhé improvementofthermalstabilityvian2h2andd2oradicalannealingtreatmentinatomiclayerdepositionofhfo2gateoxide
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AT línmínhé lìyòngdànqīnghéshuǐqìdiànjiāngchùlǐgǎishànyuánzicénghuàxuéqìxiāngchénjīhfo2gāojièdiànzhájíyǎnghuàbáomózhīrèwěndìngxìng
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