Nitrogen incorporated Hafnium Dioxide dielectric thin film For Organic Thin Film Transistors
碩士 === 國立清華大學 === 材料科學工程學系 === 97 === Hafnium oxide is a high-k dielectric material which have dielectric constant of 25,high-k dielectric material use to be a gate oxide can decrease the threshold voltage and device scale for low voltage and microelectronics. Organic thin film transistors has bee...
Main Authors: | Tsai, Li-Shiuan, 蔡立軒 |
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Other Authors: | Hwang, Jenn-Chang |
Format: | Others |
Language: | zh-TW |
Published: |
2009
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Online Access: | http://ndltd.ncl.edu.tw/handle/05427454364168925544 |
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