| Summary: | 碩士 === 國立虎尾科技大學 === 光電與材料科技研究所 === 97 === Abstract
This study is mainly about the physical vapor deposition (PVD) in the system regulation. After depositing, we want to know the influence of its face shape to the thin film and the surface roughness. In the experimental aspect, we take the aluminum as the material to view of each parameter of physical deposition, for example; the temperature of substrate, the sputter time and the power of regulation process, could be the datum value of each parameter. We match molecular dynamics to present that the different parameters could cause the different condition and the influence to its face shape and the surface roughness. Under these conditions, we discover that the situation of surface after depositing, the roughness value is almost the same with the previous scientific literature. It confirmed that the tests of the physical deposition have the suitable accuracy with the thin film surface. By the system regulation in regarding the common traits between the parameter and roughness, the temperature holds the very important factor in all parameters. It has been maintaining the concurrent change between the temperature and the surface roughness. As for other parameter influence, it has the discrepancy, which is because the parameter in the experiment adds in its hypothesis difference and parameter themselves could influence with each other.
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