Growth Characteristics of Nanoscale Thin Films
碩士 === 國立虎尾科技大學 === 光電與材料科技研究所 === 97 === Abstract This study is mainly about the physical vapor deposition (PVD) in the system regulation. After depositing, we want to know the influence of its face shape to the thin film and the surface roughness. In the experimental aspect, we take the aluminu...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/kf42r7 |