| Summary: | 碩士 === 大同大學 === 化學工程學系(所) === 97 === The wastewater from semiconductor industries containing non-biodegradable and toxic organic compounds is one important issue environmental contamination. Many researches showed that advanced oxidation processes (AOPs) could treat organic contaminants by generating hydroxyl radical possessing mighty oxidation ability to decompose the contaminants non-selectively. In order to design an AOP, the reaction kinetic model for the specific pollutant is necessary information. This study aims at investigating the decomposition of acetone by UV/H2O2 process under varying experimental conditions such as agitation speed, hydrogen peroxide concentration, initial acetone concentration, reaction temperature, initial pH, UV irradiation power and dissolved oxygen concentration. The results show that the acetone decomposition rate increases with increasing agitation speed up to 500 rpm so that the mass transfer resistance can be neglected. The reaction rate remains almost constant at lower pH and then decreases with increasing pH values. The reaction rate has a optima ratio of hydrogen peroxide concentration. The reaction rate increases with increasing reaction temperature. The reaction rate decreases with increasing initial acetone concentration. The reaction rate increases with increasing UV irradiation power and dissolved oxygen concentration. A kinetic model for H2O2 decomposition by UV was proposed to correlate different H2O2 concentration at different temperatures. The experimental data and the model predicted results were in good agreement. An empirical kinetic model of acetone decomposition by UV was proposed to correlate different H2O2 and acetone concentration.
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