Investigate of high performance HfO2 gate dielectric thin film transistor applications
碩士 === 長庚大學 === 光電工程研究所 === 98 === In this thesis, low temperature processes (< 300) were developed℃ in the fabricating metal–insulator–metal oxide (MIM) capacitors, and oxide-based thin film transistor (TFTs) using either transparent ZnO films deposited by pulsed laser deposition (PLD) or IZO fi...
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| Format: | Others |
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2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/46054590088974177931 |