A Study on Deposition of Electrochromic Nickel Oxides Thin Films by Atmospheric Pressure Plasmas

• Main Authors: Di-Jiun Lin, 林帝均
• Other Authors: Yung-Sen Lin
• Format: Others
• Language: zh-TW
• Published: 2010
• Online Access: http://ndltd.ncl.edu.tw/handle/51976157990402197922

碩士 === 逢甲大學 === 化學工程學所 === 98 === Global warming and the energy crisis are becoming the key topics all over the world. Most countries are already putting huge amounts of efforts in order to come with some solutions or ideas. One of these ideas is energy saving material such as “electrochromic thin film”. Such materials can reduce sunlight so that internal structure temperature would not rise. The light reduction is achieved by adjusting the low drive voltage thus controlling the voltage to light transmission rate, which will reduce the air conditioning energy. In this study, nickel oxide thin film was prepared by using atmospheric pressure plasma polymerization. The advantages of this process are that it is quicker than the other past process. The general process is to produce the plasma in a stable manner and so the system must operate at low pressure. The process therefore requires a vacuum chamber and vacuum pump to maintain the low-pressure environment, which not only raises the cost, but also maintenance costs are quite high.The atmospheric pressure plasma polymerization system can be carried out at regular atmospheric pressure coating. No expensive vacuum systems, no time wasting while waiting for the vacuum to finish and no restrictions on the vacuum chamber. The volume can be very flexible as required and can be in a continuous production. There could be wide range of applications for it. The deposition rate is also faster to meet the needs of industrial production. We prepared nickel oxide, the color efficiency in the anode material were relatively high. An electro-chromic device exhibits excellent stability and performance. It had made the electro-chromic nickel oxide thin film materials a popular field of research and has been widely studied in recent years .There are many ways to produce electro-chromic materials. Wide use of electro-chromic materials will contribute to achieving large-scale commercialization of low cost production. The purpose of this study is to use atmospheric pressure plasma to prepare nickel oxide thin films (Glass / ITO / NiO). Study the effects of different operating parameters such as changes in plasma torch height or monomer inlet angle. The thickness and surface morphology of the nickel oxide films were scanned by the field emission scanning electron microscope (FESEM). An electrochemical analyzer was used to analyze the electrochemical properties and a UV-visible spectrum analyzer for the optical properties of the thin films. According to the above we can calculate and discuss the optical density difference, coloration efficiency and ionic in-mobility/out-mobility x. The result of the study is a successful coating of fine electro-chromic properties of nickel oxide thin film can be achieved with atmospheric pressure plasma process at room temperature. From the cycle-voltammetry method test, the result was a 43% transmittance change under 550nm, and has good stability by testing continuously 200cycles and no recession. It showed a great developmental and production potential.