The Structural and Electrochromic Properties of Molybdenum Trioxide Films Deposited by RF Magnetron Sputtering

• Main Authors: Yin-ChanHuang, 黃胤展
• Other Authors: Shih-Chin Lee
• Format: Others
• Language: zh-TW
• Published: 2010
• Online Access: http://ndltd.ncl.edu.tw/handle/98747139830762270935

碩士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 98 === Electrochromisms had been widely investigated as a new energy harvesting material due to its potential applications for smart window of architecture, automobile glazing to save energy, modulate the transmission of light and solar radiation and also liquid crystal displays. Therefore, the object of this study was focused on the effects of sputtering conditions on the composition, microstructure and electrochromic properties of molybdenum trioxide films prepared by r.f. magnetron sputtering. Experimental results indicated that with increasing oxygen partial pressures, oxygen content of the films was increased which was tend to form α-MoO3 phase structure with higher stoichiometry. The films deposited at oxygen partial pressure of 80% showed the best electrochromic reversibility, and the transmission change betweencolored and bleached states at a wavelength of 550nm was 35.50%. Also, the film exhibited higher optical density, and coloration efficiency was 23.81cm2/C. Then the molybdenum trioxide films were deposited under varied substrate temperature. It was also found that the crystallinity of films was obtained when the substrate temperature reached 250℃. As the substrate temperature increasing from room temperature to 350℃, the optical band gap increased from 2.82 to 3.07eV due to the formation of α-MoO3 structure with opening tunnel driven by the thermal energy acquired from the heating of the substrate. When the substrate temperature was 350℃, the films showed the best transmission change between colored andbleached states at a wavelength of 550nm was 35.50% and coloration efficiency was 23.81cm2/C.