Characteristics of Raman Spectra of Hydrogenated Amorphous Carbon Films

碩士 === 國立中央大學 === 光電科學研究所 === 98 === In this thesis,we use mainly the Raman spectroscopy and UV-VIS-NIR spectroscopy to study the characteristics of hydrogenated amorphous carbon thin films which are made by the Plasma Enhanced Chemical Vapor Deposition (PECVD) method. These films were made in diffe...

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Bibliographic Details
Main Authors: Ita Wang, 王一大
Other Authors: Cheng-Chung Lee
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/33442263575533392714
Description
Summary:碩士 === 國立中央大學 === 光電科學研究所 === 98 === In this thesis,we use mainly the Raman spectroscopy and UV-VIS-NIR spectroscopy to study the characteristics of hydrogenated amorphous carbon thin films which are made by the Plasma Enhanced Chemical Vapor Deposition (PECVD) method. These films were made in different ratios of precursor gas[C6H6 ,HMDS(C6H18Si2NH) and HMDSO(C6H18Si2O)] and deposition time(30min,60min,and 90min).The experimental results are as follows: films which use C6H6 as its precursor gas contain most sp2 bondings of carbon,as a result, have the lowest transmittance of visual light(the average transmittance is about 10% in deposition time of 90min); films which use HMDS as its precursor gas contain least sp2 bondings of carbon,as a result, have the highest transmittance(the average transmittance is about 60% in deposition time of 90min). Films which use C6H6 as its precursor gas have the smallest relative optical gap[the average value is about 1.0 (e.v.)],and films which use HMDS as its precursor gas have the largest relative optical gap[the average value is about 2.1 (e.v.)].Films which use HMDS,HMDSO,and HMDS+HMDSO respectively as its precursor gas have both its relative optical gap and sp3 bondings of carbon increased as deposition time increases.