The Research on the Most Appropriate Temperature Condition for UV reforming process in Liquid Crystal Display by Taguchi method

碩士 === 國立彰化師範大學 === 機電工程學系 === 98 === Abstract This paper is dealing with the finding of the most appropriate temperature conditions for the UV reforming process in liquid crystal Display (LCD). The UV reforming process is to be used to increase the contrast ratio of LCD. It is known that the circu...

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Main Author: 石文斌
Other Authors: 王宜明
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/54401467838595642723
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spelling ndltd-TW-098NCUE54890222015-11-04T04:01:42Z http://ndltd.ncl.edu.tw/handle/54401467838595642723 The Research on the Most Appropriate Temperature Condition for UV reforming process in Liquid Crystal Display by Taguchi method 田口法應用於液晶顯示器紫外線改質製程溫度最適化研究 石文斌 碩士 國立彰化師範大學 機電工程學系 98 Abstract This paper is dealing with the finding of the most appropriate temperature conditions for the UV reforming process in liquid crystal Display (LCD). The UV reforming process is to be used to increase the contrast ratio of LCD. It is known that the circumstance temperature is a crucial role during the reforming process. The surface temperature of glass substrate has to be controlled under 40 , and the allowable value of temperature difference of glass substrate should be within +/- 5 . Therefore, the Taguchi method is employed to investigate the influence produced by the adjustment of related devices to the temperature during the UV reforming process, and thereafter finding the optimal parameter tuning model. In addition, with the aid of specialized characters analysis together with working experience, eight controllable factors are found. The optimal temperature related parameters are also obtained by analyzing the results of experiments. By the use of additive model to predict the actual improvement benefit in the process via these optimal parameters, and then verifying those values with the experimental results. It shows that the uniformity of surface temperature is significantly affected by the interval between UV lamps and the air blowing capacity from air-box. The prediction difference between the result from experiments and the values from additive model is tiny. Hence, the result of this study provides useful information to further design. Keywords: Taguchi method, additive model forecast 王宜明 2010 學位論文 ; thesis 81 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立彰化師範大學 === 機電工程學系 === 98 === Abstract This paper is dealing with the finding of the most appropriate temperature conditions for the UV reforming process in liquid crystal Display (LCD). The UV reforming process is to be used to increase the contrast ratio of LCD. It is known that the circumstance temperature is a crucial role during the reforming process. The surface temperature of glass substrate has to be controlled under 40 , and the allowable value of temperature difference of glass substrate should be within +/- 5 . Therefore, the Taguchi method is employed to investigate the influence produced by the adjustment of related devices to the temperature during the UV reforming process, and thereafter finding the optimal parameter tuning model. In addition, with the aid of specialized characters analysis together with working experience, eight controllable factors are found. The optimal temperature related parameters are also obtained by analyzing the results of experiments. By the use of additive model to predict the actual improvement benefit in the process via these optimal parameters, and then verifying those values with the experimental results. It shows that the uniformity of surface temperature is significantly affected by the interval between UV lamps and the air blowing capacity from air-box. The prediction difference between the result from experiments and the values from additive model is tiny. Hence, the result of this study provides useful information to further design. Keywords: Taguchi method, additive model forecast
author2 王宜明
author_facet 王宜明
石文斌
author 石文斌
spellingShingle 石文斌
The Research on the Most Appropriate Temperature Condition for UV reforming process in Liquid Crystal Display by Taguchi method
author_sort 石文斌
title The Research on the Most Appropriate Temperature Condition for UV reforming process in Liquid Crystal Display by Taguchi method
title_short The Research on the Most Appropriate Temperature Condition for UV reforming process in Liquid Crystal Display by Taguchi method
title_full The Research on the Most Appropriate Temperature Condition for UV reforming process in Liquid Crystal Display by Taguchi method
title_fullStr The Research on the Most Appropriate Temperature Condition for UV reforming process in Liquid Crystal Display by Taguchi method
title_full_unstemmed The Research on the Most Appropriate Temperature Condition for UV reforming process in Liquid Crystal Display by Taguchi method
title_sort research on the most appropriate temperature condition for uv reforming process in liquid crystal display by taguchi method
publishDate 2010
url http://ndltd.ncl.edu.tw/handle/54401467838595642723
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