The Research on the Most Appropriate Temperature Condition for UV reforming process in Liquid Crystal Display by Taguchi method
碩士 === 國立彰化師範大學 === 機電工程學系 === 98 === Abstract This paper is dealing with the finding of the most appropriate temperature conditions for the UV reforming process in liquid crystal Display (LCD). The UV reforming process is to be used to increase the contrast ratio of LCD. It is known that the circu...
Main Author: | |
---|---|
Other Authors: | |
Format: | Others |
Language: | zh-TW |
Published: |
2010
|
Online Access: | http://ndltd.ncl.edu.tw/handle/54401467838595642723 |
id |
ndltd-TW-098NCUE5489022 |
---|---|
record_format |
oai_dc |
spelling |
ndltd-TW-098NCUE54890222015-11-04T04:01:42Z http://ndltd.ncl.edu.tw/handle/54401467838595642723 The Research on the Most Appropriate Temperature Condition for UV reforming process in Liquid Crystal Display by Taguchi method 田口法應用於液晶顯示器紫外線改質製程溫度最適化研究 石文斌 碩士 國立彰化師範大學 機電工程學系 98 Abstract This paper is dealing with the finding of the most appropriate temperature conditions for the UV reforming process in liquid crystal Display (LCD). The UV reforming process is to be used to increase the contrast ratio of LCD. It is known that the circumstance temperature is a crucial role during the reforming process. The surface temperature of glass substrate has to be controlled under 40 , and the allowable value of temperature difference of glass substrate should be within +/- 5 . Therefore, the Taguchi method is employed to investigate the influence produced by the adjustment of related devices to the temperature during the UV reforming process, and thereafter finding the optimal parameter tuning model. In addition, with the aid of specialized characters analysis together with working experience, eight controllable factors are found. The optimal temperature related parameters are also obtained by analyzing the results of experiments. By the use of additive model to predict the actual improvement benefit in the process via these optimal parameters, and then verifying those values with the experimental results. It shows that the uniformity of surface temperature is significantly affected by the interval between UV lamps and the air blowing capacity from air-box. The prediction difference between the result from experiments and the values from additive model is tiny. Hence, the result of this study provides useful information to further design. Keywords: Taguchi method, additive model forecast 王宜明 2010 學位論文 ; thesis 81 zh-TW |
collection |
NDLTD |
language |
zh-TW |
format |
Others
|
sources |
NDLTD |
description |
碩士 === 國立彰化師範大學 === 機電工程學系 === 98 === Abstract
This paper is dealing with the finding of the most appropriate temperature conditions for the UV reforming process in liquid crystal Display (LCD). The UV reforming process is to be used to increase the contrast ratio of LCD. It is known that the circumstance temperature is a crucial role during the reforming process. The surface temperature of glass substrate has to be controlled under 40 , and the allowable value of temperature difference of glass substrate should be within +/- 5 . Therefore, the Taguchi method is employed to investigate the influence produced by the adjustment of related devices to the temperature during the UV reforming process, and thereafter finding the optimal parameter tuning model. In addition, with the aid of specialized characters analysis together with working experience, eight controllable factors are found. The optimal temperature related parameters are also obtained by analyzing the results of experiments.
By the use of additive model to predict the actual improvement benefit in the process via these optimal parameters, and then verifying those values with the experimental results. It shows that the uniformity of surface temperature is significantly affected by the interval between UV lamps and the air blowing capacity from air-box. The prediction difference between the result from experiments and the values from additive model is tiny. Hence, the result of this study provides useful information to further design.
Keywords: Taguchi method, additive model forecast
|
author2 |
王宜明 |
author_facet |
王宜明 石文斌 |
author |
石文斌 |
spellingShingle |
石文斌 The Research on the Most Appropriate Temperature Condition for UV reforming process in Liquid Crystal Display by Taguchi method |
author_sort |
石文斌 |
title |
The Research on the Most Appropriate Temperature Condition for UV reforming process in Liquid Crystal Display by Taguchi method |
title_short |
The Research on the Most Appropriate Temperature Condition for UV reforming process in Liquid Crystal Display by Taguchi method |
title_full |
The Research on the Most Appropriate Temperature Condition for UV reforming process in Liquid Crystal Display by Taguchi method |
title_fullStr |
The Research on the Most Appropriate Temperature Condition for UV reforming process in Liquid Crystal Display by Taguchi method |
title_full_unstemmed |
The Research on the Most Appropriate Temperature Condition for UV reforming process in Liquid Crystal Display by Taguchi method |
title_sort |
research on the most appropriate temperature condition for uv reforming process in liquid crystal display by taguchi method |
publishDate |
2010 |
url |
http://ndltd.ncl.edu.tw/handle/54401467838595642723 |
work_keys_str_mv |
AT shíwénbīn theresearchonthemostappropriatetemperatureconditionforuvreformingprocessinliquidcrystaldisplaybytaguchimethod AT shíwénbīn tiánkǒufǎyīngyòngyúyèjīngxiǎnshìqìzǐwàixiàngǎizhìzhìchéngwēndùzuìshìhuàyánjiū AT shíwénbīn researchonthemostappropriatetemperatureconditionforuvreformingprocessinliquidcrystaldisplaybytaguchimethod |
_version_ |
1718124354959572992 |