Characteristics of Flexible ZnO Transparent Conducting Thin Films

碩士 === 正修科技大學 === 電子工程研究所 === 99 === In this paper, the aluminum doped zinc oxide (AZO) thin films have been prepare by direct current magnetron sputtering on flexible substrate, that was divided into five parts. The first part to fifth part are various substrate temperature, added the buffer layer,...

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Main Authors: Ming-chieh Chuang, 莊明潔
Other Authors: 王納富
Format: Others
Language:zh-TW
Published: 2011
Online Access:http://ndltd.ncl.edu.tw/handle/39460939089572059700
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spelling ndltd-TW-099CSU004280122015-10-13T20:32:28Z http://ndltd.ncl.edu.tw/handle/39460939089572059700 Characteristics of Flexible ZnO Transparent Conducting Thin Films 可撓式氧化鋅透明導電薄膜之特性研究 Ming-chieh Chuang 莊明潔 碩士 正修科技大學 電子工程研究所 99 In this paper, the aluminum doped zinc oxide (AZO) thin films have been prepare by direct current magnetron sputtering on flexible substrate, that was divided into five parts. The first part to fifth part are various substrate temperature, added the buffer layer, various process pressure, various substrate bias voltage, and various process power. Those effects of process parameters for thin films properties were investigated. The experimental results were analyzed by X-ray diffraction, Hall measurement, UV-Vis, and FE-SEM. The properties of structure, properties, electrical properties, optical properties, and surface morphology by measuring instruments, and then adding stress principle of the XRD analyzed was discussed, finally. From the experimental result, there are the highest carrier concentration 2.47 x1020 cm-3, the highest Hall mobility 11.1 cm2/Vs, and the lowest resistivity 2.28x10-3 Ω-cm, when the substrate and process pressure are 110 oC and 3 mtorr. 王納富 蔡有仁 2011 學位論文 ; thesis 0 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 正修科技大學 === 電子工程研究所 === 99 === In this paper, the aluminum doped zinc oxide (AZO) thin films have been prepare by direct current magnetron sputtering on flexible substrate, that was divided into five parts. The first part to fifth part are various substrate temperature, added the buffer layer, various process pressure, various substrate bias voltage, and various process power. Those effects of process parameters for thin films properties were investigated. The experimental results were analyzed by X-ray diffraction, Hall measurement, UV-Vis, and FE-SEM. The properties of structure, properties, electrical properties, optical properties, and surface morphology by measuring instruments, and then adding stress principle of the XRD analyzed was discussed, finally. From the experimental result, there are the highest carrier concentration 2.47 x1020 cm-3, the highest Hall mobility 11.1 cm2/Vs, and the lowest resistivity 2.28x10-3 Ω-cm, when the substrate and process pressure are 110 oC and 3 mtorr.
author2 王納富
author_facet 王納富
Ming-chieh Chuang
莊明潔
author Ming-chieh Chuang
莊明潔
spellingShingle Ming-chieh Chuang
莊明潔
Characteristics of Flexible ZnO Transparent Conducting Thin Films
author_sort Ming-chieh Chuang
title Characteristics of Flexible ZnO Transparent Conducting Thin Films
title_short Characteristics of Flexible ZnO Transparent Conducting Thin Films
title_full Characteristics of Flexible ZnO Transparent Conducting Thin Films
title_fullStr Characteristics of Flexible ZnO Transparent Conducting Thin Films
title_full_unstemmed Characteristics of Flexible ZnO Transparent Conducting Thin Films
title_sort characteristics of flexible zno transparent conducting thin films
publishDate 2011
url http://ndltd.ncl.edu.tw/handle/39460939089572059700
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