| Summary: | 碩士 === 國立交通大學 === 顯示科技研究所 === 99 === This article introduce that we utilize high density plasma chemical vapor deposition to develop thin film amorphous solar cell. We will discuss about thin film deposition, strengths and weaknesses of material, the characteristic of amorphous thin film solar cell. We will describe the production of solar cell process steps in detail. In order to complete stable and high-efficiency solar cells, we optimize properties of solar cell components. First, we improve the electrical elements. We modulation doping to change the open circuit voltage, and then modulated the thickness of absorbing layer to change short-circuit current and fill factor, to obtain high efficiency amorphous solar cells. Then we do it from the material, improved by reducing the defect density, we succeeded in raising short-circuit current and fill factor. And because the pressure increase, we can obtain better uniformity, Currently 0.09 square centimeter
area of the solar cells, conversion efficiency can be stabilized at 9.25%. In addition to glass substrates, we have integrated process into the the polyimide flexible substrate, to obtain the conversion efficiency of 4.8%.
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