以離子輔助電子槍蒸鍍法製備多層Notch濾光片

• Main Author: 柯隆閔
• Other Authors: 林義成教授
• Format: Others
• Language: zh-TW
• Published: 2011
• Online Access: http://ndltd.ncl.edu.tw/handle/05447983575741171394

碩士 === 國立彰化師範大學 === 機電工程學系 === 99 === The main purpose of is using the ion auxiliary electron gun evaporation to prepare multi-layer notch filters. First, we must study the thin-film optics the elementary theory and the correlation technique. It includes the thin-film optics aspects, the performance computation, initial membrane department's design and preparation of thin film. Then, discover high refractive index material Ta2O5 and the low refractive index material SiO2 best system regulation parameter (The IAD voltage and electric current, IAD gas flow amount, evaporation speed), decide the best optical constant. Finally, takes the optical thin-film height refraction film using Ta2O5 and SiO2 the design and the application . Gives the film the initial membrane to pile first, then again , makes the film optimization design with optical thin-film design software Essential Macleod, obtains wave band effect which needs, makes plates the notch filters . The advantages to apply IAD source to assist coating is listed belows： enhance the packing density, reduce the wavelength drifts, reducs the Absorption & Scattering.