Study on the fabrication and device characteristics of ZnO thin films for resistance random access memory applications

碩士 === 國立清華大學 === 材料科學工程學系 === 99

Bibliographic Details
Main Authors: Chou, Kuan-Yu, 周冠宇
Other Authors: Lin, Su-Jien
Format: Others
Language:zh-TW
Published: 2011
Online Access:http://ndltd.ncl.edu.tw/handle/07050778320400102829
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spelling ndltd-TW-099NTHU51591272015-10-13T20:23:00Z http://ndltd.ncl.edu.tw/handle/07050778320400102829 Study on the fabrication and device characteristics of ZnO thin films for resistance random access memory applications 應用於電阻式記憶體之氧化鋅薄膜製程與元件特性研究 Chou, Kuan-Yu 周冠宇 碩士 國立清華大學 材料科學工程學系 99 Lin, Su-Jien Chueh, Yu-Lun 林樹均 闕郁倫 2011 學位論文 ; thesis 116 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立清華大學 === 材料科學工程學系 === 99
author2 Lin, Su-Jien
author_facet Lin, Su-Jien
Chou, Kuan-Yu
周冠宇
author Chou, Kuan-Yu
周冠宇
spellingShingle Chou, Kuan-Yu
周冠宇
Study on the fabrication and device characteristics of ZnO thin films for resistance random access memory applications
author_sort Chou, Kuan-Yu
title Study on the fabrication and device characteristics of ZnO thin films for resistance random access memory applications
title_short Study on the fabrication and device characteristics of ZnO thin films for resistance random access memory applications
title_full Study on the fabrication and device characteristics of ZnO thin films for resistance random access memory applications
title_fullStr Study on the fabrication and device characteristics of ZnO thin films for resistance random access memory applications
title_full_unstemmed Study on the fabrication and device characteristics of ZnO thin films for resistance random access memory applications
title_sort study on the fabrication and device characteristics of zno thin films for resistance random access memory applications
publishDate 2011
url http://ndltd.ncl.edu.tw/handle/07050778320400102829
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