Non-toxic sol-gel processes of P- and N-type ZnO transparent conductive thin films
碩士 === 國立臺灣大學 === 光電工程學研究所 === 99 === We investigate nontoxic fabrication processes to derive P and N-type ZnO transparent conductive thin films by sol-gel method and discuss how anneal condition effect the characteristics of P and N-type ZnO thin films. In the first part of the thesis, in order to...
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ndltd-TW-099NTU051240202015-10-16T04:02:50Z http://ndltd.ncl.edu.tw/handle/07293932850873923910 Non-toxic sol-gel processes of P- and N-type ZnO transparent conductive thin films 無毒性溶膠凝膠之P及N型氧化鋅透明導電薄膜製程研究 Wen-Jie Wang 王文杰 碩士 國立臺灣大學 光電工程學研究所 99 We investigate nontoxic fabrication processes to derive P and N-type ZnO transparent conductive thin films by sol-gel method and discuss how anneal condition effect the characteristics of P and N-type ZnO thin films. In the first part of the thesis, in order to fabricate P-type ZnO transparent conductive thin films, zinc acetate dehydrate was firstly dissolved in 2-propanol with ethanolamine as the stabilizer and ammonium acetate and indium(Ш) nitrate pentahydrate were used as co-doping materials. In three kinds of different anneal ambients(O2、N2 and vacuum), ZnO thin films exhibit p-type electrical properties only when they were annealed in oxygen ambient, with hole concentration of +1.58×10^17cm^-3、resistivity of 55.11Ω‧cm and carrier mobility of 0.72cm^2V^-1s^-1. The second part of the thesis describes the fabrication processes for N-type ZnO transparent conductive thin films. The preparation of precursor solution is similar to P-type ZnO, except that the doping material is only indium(Ш) nitrate pentahydrate. We discuss how different doping concentration(0.75%、1.00%、2.00%、3.00%、5.00%) and anneal ambients(O2、N2 and vacuum) effect the characteristics of N-type ZnO to get the better result. The result show that the N-type ZnO thin films with electron concentration of -1.35×10^18cm^-3、resistivity of 2.62Ω‧cm and carrier mobility of 1.77cm^2V^-1s^-1 at doping concentration of 2.00% in nitrogen ambient were achieved. On the other hand, the electrical properties of N-type ZnO thin films at doping concentration of 2.00% can be enhanced again with electron concentration of -2.34×10^19 cm^-3、resistivity of 2.16×10^-2Ω‧cm and carrier mobility of 12.33 cm^2V^-1s^-1 after first anneal in nitrogen ambient and second anneal in vacuum ambient. Chih-I Wu 吳志毅 2011 學位論文 ; thesis 74 zh-TW |
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碩士 === 國立臺灣大學 === 光電工程學研究所 === 99 === We investigate nontoxic fabrication processes to derive P and N-type ZnO transparent conductive thin films by sol-gel method and discuss how anneal condition effect the characteristics of P and N-type ZnO thin films.
In the first part of the thesis, in order to fabricate P-type ZnO transparent conductive thin films, zinc acetate dehydrate was firstly dissolved in 2-propanol with ethanolamine as the stabilizer and ammonium acetate and indium(Ш) nitrate pentahydrate were used as co-doping materials. In three kinds of different anneal ambients(O2、N2 and vacuum), ZnO thin films exhibit p-type electrical properties only when they were annealed in oxygen ambient, with hole concentration of +1.58×10^17cm^-3、resistivity of 55.11Ω‧cm and carrier mobility of 0.72cm^2V^-1s^-1.
The second part of the thesis describes the fabrication processes for N-type ZnO transparent conductive thin films. The preparation of precursor solution is similar to P-type ZnO, except that the doping material is only indium(Ш) nitrate pentahydrate. We discuss how different doping concentration(0.75%、1.00%、2.00%、3.00%、5.00%) and anneal ambients(O2、N2 and vacuum) effect the characteristics of N-type ZnO to get the better result. The result show that the N-type ZnO thin films with electron concentration of -1.35×10^18cm^-3、resistivity of 2.62Ω‧cm and carrier mobility of 1.77cm^2V^-1s^-1 at doping concentration of 2.00% in nitrogen ambient were achieved.
On the other hand, the electrical properties of N-type ZnO thin films at doping concentration of 2.00% can be enhanced again with electron concentration of -2.34×10^19 cm^-3、resistivity of 2.16×10^-2Ω‧cm and carrier mobility of 12.33 cm^2V^-1s^-1 after first anneal in nitrogen ambient and second anneal in vacuum ambient.
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author2 |
Chih-I Wu |
author_facet |
Chih-I Wu Wen-Jie Wang 王文杰 |
author |
Wen-Jie Wang 王文杰 |
spellingShingle |
Wen-Jie Wang 王文杰 Non-toxic sol-gel processes of P- and N-type ZnO transparent conductive thin films |
author_sort |
Wen-Jie Wang |
title |
Non-toxic sol-gel processes of P- and N-type ZnO transparent conductive thin films |
title_short |
Non-toxic sol-gel processes of P- and N-type ZnO transparent conductive thin films |
title_full |
Non-toxic sol-gel processes of P- and N-type ZnO transparent conductive thin films |
title_fullStr |
Non-toxic sol-gel processes of P- and N-type ZnO transparent conductive thin films |
title_full_unstemmed |
Non-toxic sol-gel processes of P- and N-type ZnO transparent conductive thin films |
title_sort |
non-toxic sol-gel processes of p- and n-type zno transparent conductive thin films |
publishDate |
2011 |
url |
http://ndltd.ncl.edu.tw/handle/07293932850873923910 |
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