The parallel anodizing treatment technology for processing equipment components of large-size TFT-LCDs
碩士 === 國立虎尾科技大學 === 光電與材料科技研究所 === 99 === Abstract For liquid crystal displays (LCDs), the demand of large-size panels in the market currently increases day by day. Therefore, the sizes for processing equipment components of most TFT-LCD manufacturers must be raised such as susceptor, shadow frame,...
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ndltd-TW-099NYPI51240032019-10-18T05:20:58Z http://ndltd.ncl.edu.tw/handle/2fy229 The parallel anodizing treatment technology for processing equipment components of large-size TFT-LCDs 大尺寸TFT-LCD製程設備零件之水平式陽極處理技術開發 Ho-Mi Ku 古和秘 碩士 國立虎尾科技大學 光電與材料科技研究所 99 Abstract For liquid crystal displays (LCDs), the demand of large-size panels in the market currently increases day by day. Therefore, the sizes for processing equipment components of most TFT-LCD manufacturers must be raised such as susceptor, shadow frame, ext. frame, diffuser process kit, backing plate, etc., resulting in that there are some challenges of technique and equipment cost for the present “vertical anode treatment technology”. In this thesis, we have studied the parallel thin film treatment technology of anode surface for optoelectronic equipment components of TFT-LCD manufacturers. Firstly, the experimental parameters have been estimated with the fabrication of simulating experimental tank by the similar figures’ theory, the plan for fluid fields of electroplating fluids, literature analysis, and expert conferences, developing the analysis technology of Taguchi method for quality engineering and their concept of experimental design. The analysis of experimental data can not only modulate the experimental parameters but also evaluate the stabilities of processes. This study focuses on the parallel tank and we have investigated the dependence of pipe diameter, pump pressure, dip height, and liquid height upon the film thickness of anode with the analysis technology of processing parameters and the measurement technology of physical properties. The experimental results manifest that the film thickness of anode closely approaches the setting average value under the same experimental conditions while the pipe diameter, pump pressure, dip height, and liquid height are 1.5 inch, 3 MPa, 60 cm, and 90 cm, respectively. With this study, we hope to solve the current difficulties for the anode treatment of large-size recycled aluminum alloys, lower the processing cost, and enhance the processing stabilities as well as performances of products. Keywords: Anodizing;Taguchi Methods 莊賦祥 2011 學位論文 ; thesis 77 zh-TW |
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碩士 === 國立虎尾科技大學 === 光電與材料科技研究所 === 99 === Abstract
For liquid crystal displays (LCDs), the demand of large-size panels in the market currently increases day by day. Therefore, the sizes for processing equipment components of most TFT-LCD manufacturers must be raised such as susceptor, shadow frame, ext. frame, diffuser process kit, backing plate, etc., resulting in that there are some challenges of technique and equipment cost for the present “vertical anode treatment technology”. In this thesis, we have studied the parallel thin film treatment technology of anode surface for optoelectronic equipment components of TFT-LCD manufacturers. Firstly, the experimental parameters have been estimated with the fabrication of simulating experimental tank by the similar figures’ theory, the plan for fluid fields of electroplating fluids, literature analysis, and expert conferences, developing the analysis technology of Taguchi method for quality engineering and their concept of experimental design. The analysis of experimental data can not only modulate the experimental parameters but also evaluate the stabilities of processes. This study focuses on the parallel tank and we have investigated the dependence of pipe diameter, pump pressure, dip height, and liquid height upon the film thickness of anode with the analysis technology of processing parameters and the measurement technology of physical properties. The experimental results manifest that the film thickness of anode closely approaches the setting average value under the same experimental conditions while the pipe diameter, pump pressure, dip height, and liquid height are 1.5 inch, 3 MPa, 60 cm, and 90 cm, respectively. With this study, we hope to solve the current difficulties for the anode treatment of large-size recycled aluminum alloys, lower the processing cost, and enhance the processing stabilities as well as performances of products.
Keywords: Anodizing;Taguchi Methods
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莊賦祥 |
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莊賦祥 Ho-Mi Ku 古和秘 |
author |
Ho-Mi Ku 古和秘 |
spellingShingle |
Ho-Mi Ku 古和秘 The parallel anodizing treatment technology for processing equipment components of large-size TFT-LCDs |
author_sort |
Ho-Mi Ku |
title |
The parallel anodizing treatment technology for processing equipment components of large-size TFT-LCDs |
title_short |
The parallel anodizing treatment technology for processing equipment components of large-size TFT-LCDs |
title_full |
The parallel anodizing treatment technology for processing equipment components of large-size TFT-LCDs |
title_fullStr |
The parallel anodizing treatment technology for processing equipment components of large-size TFT-LCDs |
title_full_unstemmed |
The parallel anodizing treatment technology for processing equipment components of large-size TFT-LCDs |
title_sort |
parallel anodizing treatment technology for processing equipment components of large-size tft-lcds |
publishDate |
2011 |
url |
http://ndltd.ncl.edu.tw/handle/2fy229 |
work_keys_str_mv |
AT homiku theparallelanodizingtreatmenttechnologyforprocessingequipmentcomponentsoflargesizetftlcds AT gǔhémì theparallelanodizingtreatmenttechnologyforprocessingequipmentcomponentsoflargesizetftlcds AT homiku dàchǐcùntftlcdzhìchéngshèbèilíngjiànzhīshuǐpíngshìyángjíchùlǐjìshùkāifā AT gǔhémì dàchǐcùntftlcdzhìchéngshèbèilíngjiànzhīshuǐpíngshìyángjíchùlǐjìshùkāifā AT homiku parallelanodizingtreatmenttechnologyforprocessingequipmentcomponentsoflargesizetftlcds AT gǔhémì parallelanodizingtreatmenttechnologyforprocessingequipmentcomponentsoflargesizetftlcds |
_version_ |
1719269689714016256 |