| Summary: | 碩士 === 國立臺北科技大學 === 機電整合研究所 === 99 === Traditional manufacturing of the thin film transistor liquid crystal display (TFT-LCD) uses wet process equipments, hence producing large amounts of toxic liquid waste. This study presents a method of using dry equipment with high-precision laser isolation engraving on the LCD glass panel for non-pollution etching process. This paper will use 532nm wavelength green laser as the processing platform for insulation experiments, and aim to achieve parameter optimization of laser isolation process on the glass metal thin film through grey relational theory.
In this study of laser isolation process, the two main targets are that the glass substrate not melted and successful metal film insulation. Under the requirements of scribing the metal film with a certain groove width and minimizing the heat affected zone, we plan to integrate the laser system operating parameters to achieve the targets. Therefore, the laser parameter selections are the key elements for the isolation process. These key parameters include laser focusing position, average laser power and Q-switch frequency. Using the experimental result and the grey theory analysis, we illustrate the validity of applying the grey theory to laser isolation process. This paper verifies the application of 532nm laser to the glass panel metal film with an appropriate combination of control parameters that can obtain excellent processing performance.
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