Molecular Dynamic Simulation for Film Deposition on Si Substrate
碩士 === 國立雲林科技大學 === 機械工程系碩士班 === 99 === Molecular dynamic simulation for Cu cluster deposition on Si substrate is investigated in this work. Morse two-body potential was used to describe the Si-Cu atomic interaction. Tersoff and TB-SMA many-body potential were used to describe the interaction of Si-...
Main Authors: | Yi-Hung Li, 李宜鴻 |
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Other Authors: | Shun-Fa Hwang |
Format: | Others |
Language: | zh-TW |
Published: |
2011
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Online Access: | http://ndltd.ncl.edu.tw/handle/12191817392747802208 |
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