The Study of Semiconductor Lithography Overlay Control
碩士 === 中華大學 === 電機工程學系碩士班 === 100 === To extend Moore's law, Photolithography has to constantly reduce line width of integrated circuit. As 193nm wavelength light source for exposure has been used, the line width of variety of integrated circuits evolution from 60nm to below 30nm. However o...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/25792958880100637766 |