Nanocrystalline cuprous oxide by Electrochemical Deposition

• Main Authors: Po-Yuan Lin, 林博淵
• Other Authors: Miao-Ju Chuang
• Format: Others
• Language: zh-TW
• Published: 2012
• Online Access: http://ndltd.ncl.edu.tw/handle/22161110700425733801

碩士 === 建國科技大學 === 電子工程系暨研究所 === 100 === Nanocrystalline cuprous oxide (Cu2O) thin films were deposited on conducting tin oxide coated glass plates by electrochemical deposition method at different electrode potential, solution pH, solution concentration, deposition time and temperature. These as deposited films were characterized by X-ray diffraction (XRD), Scanning electron microscope (SEM), Atomic force microscope (AFM), UV-Visible spectrophotometer (UV-Vis), Four-point electrical measurements and Ellipsometer techniques to reveal their structural, morphological and optical properties. The quality of these films was compared and their deposition parameters were optimized. X-ray diffraction results showed that the structural is a mixed structure amorphous/polycrystalline and the preferred orientations along (200) and (111). Moreover, the average grain sizes of the polycrystalline films estimated using Scherrer formula ranged from 20-80 nm. The surface of the Cu2O film becomes rougher as the deposition temperature, solution pH and deposition time increases. The resistivity is minimized to 24.1 Ω-cm when the Cu2O film is grown at room temperature, -0.9 V versus SCE, 9±0.1 pH and the average transmittance in the visible light region is ∼65%. The optical band gap decreases as the deposition temperature increases.