Fabrication of Sub-wavelength Antireflective Structure Enhancing the Efficiency of GaAs Solar Cells

• Main Authors: Che-Chun Chang, 張哲郡
• Other Authors: Yeeu-Chang Lee
• Format: Others
• Language: zh-TW
• Published: 2012
• Online Access: http://ndltd.ncl.edu.tw/handle/95087113115889142293

碩士 === 中原大學 === 機械工程研究所 === 100 === 　　When sunlight incident on the surface of solar cell, Fresnel loss occurs at the air-solar cell’s material interface due to the refractive index difference across the interface. Fresnel loss reduces the photoelectric conversion efficiency and also increases power generation cost, which hinders wide use of solar cells. Compared with conventional anti-reflection (AR) coating, sub-wavelength structures (SWSs) not only has anti-reflective effect, but also apply to wide angle of light incident at broadband wavelength. SWSs normally has a good hydrophobicity 　　In this study, various surface morphology sub-wavelength structures were successfully fabricated on Si and GaAs substrate using polystyrene spheres lithography in conjunction with inductive coupling plasma (ICP) and high density plasma (HDP) etching processes. UV-vis-IR spectrometer was used to measure the reflectivity of various SWSs compared with the simulation results. SWSs were then fabricated on GaAs solar cell to reduce the surface reflectivity and enhance the photoelectric conversion efficiency by nano-imprinting process. Compared with the GaAs solar cell without anti-reflective film, the results show that the short circuit current (Isc) and photoelectric conversion efficiency (Eff) increased 14.7 % and 5.04 %, respectively.