Development of Low-Cost Mass-Production Anti-Reflective Thin Film by Liquid Phase Deposition for Solar Cells
碩士 === 明道大學 === 材料科學與工程學系碩士班 === 100 === In this study, titanium oxide films were deposited on 6 inch poly-si substrate by liquid phase deposition with deposition solution of ammonium hexafluoro-titanate and boric acid. The boric acid in the deposition solution can control the deposition rate of tit...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/81540179806035800708 |
| Summary: | 碩士 === 明道大學 === 材料科學與工程學系碩士班 === 100 === In this study, titanium oxide films were deposited on 6 inch poly-si substrate by liquid phase deposition with deposition solution of ammonium hexafluoro-titanate and boric acid. The boric acid in the deposition solution can control the deposition rate of titanium oxide film. Titanium oxide film optimal parameters for the process temperature of 60 degrees and the boric acid concentration of 0.6 M becomes average refractive index with reflectance spectra were 1.87 and 5.52 % within the wavelength from 400 to 900 nm after annealing. Therefore, the 6 inch poly-si solar cell was photovoltaic conversion reach 15.93 % of low-cost mass-production anti-reflective thin film by liquid phase deposition for solar cells application.
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