Hot-Wire Chemical Vapor Deposition of Si-Based Thin Films for Heterojunction Solar Cell Applications
博士 === 國立中興大學 === 材料科學與工程學系所 === 100 === Hot-wire chemical vapor deposition (HWCVD) is one of the semiconductor fabrication processes to grow thin film materials. The HWCVD system is composed of vacuum system, gas flow controls, and catalytic wires where Tungsten, Tantalum or Iridium are often u...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/48192803861965128807 |