The study of fractal film and its electrical property on the AAO substrate

• Main Authors: Chi-Shiun Li, 李其勳
• Other Authors: Sung-Ping Szu
• Format: Others
• Language: zh-TW
• Published: 2012
• Online Access: http://ndltd.ncl.edu.tw/handle/60839884957872429759

碩士 === 國立中興大學 === 物理學系所 === 100 === Silver and gold films with thickness ranged from 30 to 160nm were prepared by thermal evaporation of metal on the anodic aluminum oxide substrate with 200nm pores. The morphology of the films, studied by SEM, shows fractal characteristic. As the thickness of the films increase, the fractal dimensions of the films increase from 1.70 to 1.86 and from 1.77 to 1.94 for silver and gold films respectively, while, the coverage percentages of the films increase from 31.1 to 62.3 and from 41.2 to 82.7 for silver and gold films, respectively. The average sizes of the metal particles were estimated by the width of the X-ray diffraction peak. The results of estimation are consistent with that from the SEM micrograph. The resistances of the films as a function of temperatures were measured by four-point method. Resistance increases with temperature and the film thickness. The increase of resistance with temperature is attributed to the interaction of electron with the surface phonon. The change of the resistance coefficients of temperature with the thickness of the films is attributed to the change of Debye temperature and the change of the fractal dimension of the films. The coefficients of magnetic-resistivity are dependent on thickness but not on temperature. Such changes may ascribe to the size effect.