Reliability of HfO2 High-k Materials under Dynamic and Static Stress
碩士 === 國立暨南國際大學 === 電機工程學系 === 100 === In this thesis, we studied the reliability of HfO2 film under static stress and dynamic stress. The research topics are: (1) Effects of the surface pre-treatment； (2) Effects of the gate-electrode area. First, we used atomic layer deposition (ALD) HfO2...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/20622670106749666584 |