| Summary: | 碩士 === 國立中央大學 === 光電科學研究所碩士在職專班 === 100 === This thesis mainly refers to scrape the phenomenon of optimized application of Taguchi method for displays of vertical alignment technology Smudge disappearance rate dropped from 3.0sec to 1.0sec following design parameters of the experiment to change the panel structure constants including ITO silt size on TFT substrate and bump size and height on Color-filter substrate, and the data analysis of the experimental results Minitab Inc. Minitab 15 software refers disappearance rate and the panel structure parameters of relationship:
Disappearance rate
=-6.2348+0.703125x(Bump size)+6.15625x(Bump height)
-0.46875x(Bump height xBump size)
Based on the analysis results, bump size 17.947μm, with bump height 2.387μm optimization refers disappearance rate 0.9981sec for Smudge; panel structure parameters and by analyzing the process of establishing relations and analysis, follow-up design and variable analysis on a reference to reduce one of the industry''s heavy use of experimental conditions in the past time to change the configuration of a of impact factor single factor experiment experimental law.
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