Growth mechanism and characterizations of graphene and ZnO nanostructure

博士 === 國立中央大學 === 物理研究所 === 100 === In this thesis, we will discuss ZnO material with different orientation grown on various substrates and graphene grown on copper foil by home-made atmospheric pressure chemical vapor deposition. For c-plane ZnO films growth, the thin films were grown on c-pla...

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Main Authors: Chung-Wei Chen, 陳重維
Other Authors: Gou-Chung Chi
Format: Others
Language:en_US
Published: 2012
Online Access:http://ndltd.ncl.edu.tw/handle/17949784411734816218
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spelling ndltd-TW-100NCU051980342015-10-13T21:22:39Z http://ndltd.ncl.edu.tw/handle/17949784411734816218 Growth mechanism and characterizations of graphene and ZnO nanostructure 氧化鋅與石墨烯材料成長機制與特性研究 Chung-Wei Chen 陳重維 博士 國立中央大學 物理研究所 100 In this thesis, we will discuss ZnO material with different orientation grown on various substrates and graphene grown on copper foil by home-made atmospheric pressure chemical vapor deposition. For c-plane ZnO films growth, the thin films were grown on c-plane GaN templates. The surface morphology of ZnO film depended on growth temperature and growth time. From photoluminescence (PL) spectrum, near band edge peak suggest that the film stress could be responsible for the blue shift, which corresponding to the XRD results. For the a-plane ZnO nanowires growth, the ZnO nanowires were grown on a-plane GaN templates without employing any catalyst. The growth mechanism on a-GaN was the Volmer-Weber (VW) mode and differed from the Stranski-Krastanow (SK) mode observed for growth on c-GaN. This difference results from the higher interfacial free-energy on the a-plane between ZnO and GaN than that on the c-plane orientation. m-plane ZnO thin film were successfully grown on m-plane p-GaN and be fabricated a heterosturctured light emitting diodes. I-V measurement result shows the turn on voltage was 6 volt and the electroluminescent emission peak was at 458 nm in room temperature with different injected current. Monolayer and few-layer of high-quality graphene have been grown on copper foils with different H2/ CH4 gas ratio by chemical vapor deposition at 17torr. The combination of UV ozone exposure prior to metal contact deposition and annealing of the contacts produces minimum specific contact resistances values of 7x10-7 Ω-cm2 for Ti/Au on graphene layers on SiO2/Si substrates. This is an attractive option for cleaning the graphene surface without issues related to energetic ions in O2 plasma exposures. For application, graphene sensor showed rapid change in the current when exposed to different O2 concentration ambient at room temperature. These results show the potential of graphene for O2 sensing applications. Gou-Chung Chi 紀國鐘 2012 學位論文 ; thesis 150 en_US
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language en_US
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description 博士 === 國立中央大學 === 物理研究所 === 100 === In this thesis, we will discuss ZnO material with different orientation grown on various substrates and graphene grown on copper foil by home-made atmospheric pressure chemical vapor deposition. For c-plane ZnO films growth, the thin films were grown on c-plane GaN templates. The surface morphology of ZnO film depended on growth temperature and growth time. From photoluminescence (PL) spectrum, near band edge peak suggest that the film stress could be responsible for the blue shift, which corresponding to the XRD results. For the a-plane ZnO nanowires growth, the ZnO nanowires were grown on a-plane GaN templates without employing any catalyst. The growth mechanism on a-GaN was the Volmer-Weber (VW) mode and differed from the Stranski-Krastanow (SK) mode observed for growth on c-GaN. This difference results from the higher interfacial free-energy on the a-plane between ZnO and GaN than that on the c-plane orientation. m-plane ZnO thin film were successfully grown on m-plane p-GaN and be fabricated a heterosturctured light emitting diodes. I-V measurement result shows the turn on voltage was 6 volt and the electroluminescent emission peak was at 458 nm in room temperature with different injected current. Monolayer and few-layer of high-quality graphene have been grown on copper foils with different H2/ CH4 gas ratio by chemical vapor deposition at 17torr. The combination of UV ozone exposure prior to metal contact deposition and annealing of the contacts produces minimum specific contact resistances values of 7x10-7 Ω-cm2 for Ti/Au on graphene layers on SiO2/Si substrates. This is an attractive option for cleaning the graphene surface without issues related to energetic ions in O2 plasma exposures. For application, graphene sensor showed rapid change in the current when exposed to different O2 concentration ambient at room temperature. These results show the potential of graphene for O2 sensing applications.
author2 Gou-Chung Chi
author_facet Gou-Chung Chi
Chung-Wei Chen
陳重維
author Chung-Wei Chen
陳重維
spellingShingle Chung-Wei Chen
陳重維
Growth mechanism and characterizations of graphene and ZnO nanostructure
author_sort Chung-Wei Chen
title Growth mechanism and characterizations of graphene and ZnO nanostructure
title_short Growth mechanism and characterizations of graphene and ZnO nanostructure
title_full Growth mechanism and characterizations of graphene and ZnO nanostructure
title_fullStr Growth mechanism and characterizations of graphene and ZnO nanostructure
title_full_unstemmed Growth mechanism and characterizations of graphene and ZnO nanostructure
title_sort growth mechanism and characterizations of graphene and zno nanostructure
publishDate 2012
url http://ndltd.ncl.edu.tw/handle/17949784411734816218
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