A SIMPLIFIED SPHERICAL-SYMMETRY SIMULATION MODEL FOR THE GENERATION OF 13.5-NM EXTREME ULTRAVIOLET SOURCE BY LASER-PRODUCED PLASM
碩士 === 國立臺灣大學 === 光電工程學研究所 === 100 === The development of compact and high efficiency extreme ultraviolet (EUV) light sources have evolved from academic researches to industrial applications, e.g. metrology and lithography et al. The EUV light sources based on the laser-produced plasma attract resea...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/89673501435923070852 |