| Summary: | 碩士 === 國立虎尾科技大學 === 光電與材料科技研究所 === 100 === In this study, plasma chemical vapor deposition method (Plasma EnhanceChemical Vapor Deposition, PECVD), the use of argon gas transportation Titanium Tetraisopropoxide (TTIP) vapor mixed with oxygen to produce a reaction, deposition of titanium dioxide thin films on stainless steel substrate. In the process of the deposited film, changing the plasma power, flow of carrier gas and oxygen, and this catalyst for the photocatalytic reaction to study the catalytic characteristics of methylene blue water purification. Measurement structure through X-ray diffraction (XRD), and Ultraviolet/Visible Spectrophotometer (UV-Vis) measured degradation of the methylene blue, to investigate the different process conditions of the titanium dioxide catalyst film on the degradation rate of methylene blue.
It was found that the titanium dioxide thin films prepared by plasma enhanced chemical vapor deposition system, annealing temperature and plasma power, a very close relationship. When the four isopropyl the flow 80sccm, oxygen flow 30 sccm, plasma power 300w, process pressure 200 mtorr, will be better Anatase crystal orientation (101) peak and methylene blue liquid degradation efficiency. Scherrer, equation toestimate the particle size of titanium dioxide in the range between 10~20nm, LED UV 395nm radiation, methylene blue liquid degradation conversion rate of 90%.
In addition, removal of water pollutants phenol, because phenol has a very stable chemical structure, conventional processing is quite difficult to remove, the photocatalyst thin film photocatalytic phenol compounds not only the successful decomposition of phenol and eventually mineralized into titanium dioxide and water. And increase the photocatalyst specimen, hydroxyl radical, the decomposition rate of phenol and intermediate products.
|
|---|
