A Novel Four-Masks RSD Bottom-Gated Poly-Si Thin-Film Transistors With Field Plate Design
碩士 === 逢甲大學 === 電子工程學系 === 101 === In this study “A Novel Four-Masks RSD Bottom-Gated Poly-Si Thin-Film Transistors With Field Plate Design”. We use a current and high electric field split idea to reduce the impact ionization at the drain area to improve the kink effect. Moreover, the raised Sourc...
Main Authors: | Shan-Jen Yang, 楊善任 |
---|---|
Other Authors: | Feng-Tso Chien |
Format: | Others |
Language: | zh-TW |
Published: |
2013
|
Online Access: | http://ndltd.ncl.edu.tw/handle/88814638794522874037 |
Similar Items
-
A New RSD Bottom Gate Poly-Si Thin Film Transistor With Inside Spacer
by: Yi-Hsiang Chiu, et al.
Published: (2012) -
A Novel Poly-Silicon Double-Gate Thin-Film Transistors With Dual-Gate And RSD Design
by: 游程皓
Published: (2015) -
A Novel Design of Four-Masks Bottom-Gate Poly-Si Thin Film Transistor and Study of High Voltage Planar-Gate Trench-Source VDMOSFET
by: CHO, YU-HSIANG, et al.
Published: (2019) -
Bottom-gate Poly-Si Thin Film Transistor Nonvolatile Memories with
by: Lu, Ray-Chi, et al.
Published: (2013) -
A New Combination Structure of RSD and Inside Spacer Poly-Si Thin Film Transistor
by: Min-Che Chang, et al.
Published: (2009)