Pattern Processes of Semiconductor Layers for Organic Thin-Film Transistors

• Main Authors: Hsieh, Po-Cheng, 謝博丞
• Other Authors: Cheng, Fang-Chung
• Format: Others
• Language: zh-TW
• Published: 2012
• Online Access: http://ndltd.ncl.edu.tw/handle/76258613840960810151

碩士 === 國立交通大學 === 光電工程學系 === 101 === In this study, we developed three different photolithigraphic processes to pattern the semiconductor layers in organic thin-film transistors (OTFTs). We measured electrical characteristics before and after the patterning processes and compared the differences between these processes. We found that the patterning process using conventional photoresists was not suitable for hydrophobic materials, such as poly(3-hexylthiophene). We further applied another protection layer, poly(4-vinylphenol) on the semiconductor layers. However, the active layer was also damaged during the stripping process. Therefore, we developed a two-step, solvent-free etching method, and successfully patterned the semiconductor layer in OTFTs. Finally, we used this approach to fabricate organic ambipolar devices, which can be potentially used for constructing CMOS-like inverters.