Effects of Surface Passivation on AlGaN/GaN High-Electron Mobility Transistors
碩士 === 國立東華大學 === 材料科學與工程學系 === 101 === This research mainly investigated on AlGaN/GaN high electron mobility transistors (HEMTs) using HfO2 and TiO2 as a surface passivation layer, respectively. Excellent improvements in HfO2-passivated device performances have been achieved for the present design,...
Main Authors: | Shin-Fu Lin, 林信甫 |
---|---|
Other Authors: | Yu-Shyan Lin |
Format: | Others |
Published: |
2013
|
Online Access: | http://ndltd.ncl.edu.tw/handle/77349172766757032452 |
Similar Items
-
Effects of surface passivation on breakdown of AlGaN/GaN high-electron-mobility transistors
by: Ohno, Yutaka, et al.
Published: (2004) -
Investigation on the AlGaN/GaN High Electron Mobility Transistors
by: Lin,BingCian, et al.
Published: (2012) -
Investigation of Hydrogen Peroxide Passivation on AlGaN/GaN High Electron Mobility Transistors
by: Han-YinLiu, et al.
Published: (2011) -
AlGaN/GaN High-Electron Mobility Transistors with a p-type GaN Cap Layer
by: Hsin-Chang Tsai, et al.
Published: (2017) -
Fabrication and Study of AlGaN/GaN High Electron Mobility Transistor
by: Yi-Feng Lin, et al.
Published: (2009)