Study of Low-k Dielectric RC delay time of Cu Dual Damascene Interconnect

博士 === 國立清華大學 === 材料科學工程學系 === 101 === 因申請專利緣故，資料延後公開

Bibliographic Details
Main Authors:	Huang, Cheng-Lin, 黃震麟
Other Authors:	Lai, Chih-Huang
Format:	Others
Language:	en_US
Published:	2013
Online Access:	http://ndltd.ncl.edu.tw/handle/90261802171882692825

id	ndltd-TW-101NTHU5159062
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spelling	ndltd-TW-101NTHU51590622015-10-13T22:29:57Z http://ndltd.ncl.edu.tw/handle/90261802171882692825 Study of Low-k Dielectric RC delay time of Cu Dual Damascene Interconnect 低介電係數材料應用於銅導線內連接製程之電阻電容時間延遲研究 Huang, Cheng-Lin 黃震麟博士國立清華大學材料科學工程學系 101 因申請專利緣故，資料延後公開 Lai, Chih-Huang 賴志煌 2013 學位論文 ; thesis 271 en_US
collection	NDLTD
language	en_US
format	Others
sources	NDLTD
description	博士 === 國立清華大學 === 材料科學工程學系 === 101 === 因申請專利緣故，資料延後公開
author2	Lai, Chih-Huang
author_facet	Lai, Chih-Huang Huang, Cheng-Lin 黃震麟
author	Huang, Cheng-Lin 黃震麟
spellingShingle	Huang, Cheng-Lin 黃震麟 Study of Low-k Dielectric RC delay time of Cu Dual Damascene Interconnect
author_sort	Huang, Cheng-Lin
title	Study of Low-k Dielectric RC delay time of Cu Dual Damascene Interconnect
title_short	Study of Low-k Dielectric RC delay time of Cu Dual Damascene Interconnect
title_full	Study of Low-k Dielectric RC delay time of Cu Dual Damascene Interconnect
title_fullStr	Study of Low-k Dielectric RC delay time of Cu Dual Damascene Interconnect
title_full_unstemmed	Study of Low-k Dielectric RC delay time of Cu Dual Damascene Interconnect
title_sort	study of low-k dielectric rc delay time of cu dual damascene interconnect
publishDate	2013
url	http://ndltd.ncl.edu.tw/handle/90261802171882692825
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Study of Low-k Dielectric RC delay time of Cu Dual Damascene Interconnect

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