| Summary: | 碩士 === 國立臺北科技大學 === 材料科學與工程研究所 === 101 === The metallic glass thin films have attracted considerable scientific and commercial attention due to their unique characteristics, such as high elastic energy, high hardness, good wear and corrosion resistance.
In this work, nitrogen contained and B doped Zr-Cu-Al-Ni thin film metallic glass composites (TFMGCs) were grown by magnetron co-sputtering process. Boron element was doped to evaluate its influence on the microstructure and mechanical properties of nitrogen contained TFMGCs. It was concluded that the surface roughness, microstructure, glass-forming ability and mechanical behaviors of TFMGCs were strongly influenced by the nitrogen and boron doping. The ZrN nanocrystallites were embedded in the amorphous matrix. The hardness, H/E ratio, and indentation toughness increased with increasing boron concentration. Excellent adhesion quality was also confirmed for all coatings. The Zr-based thin film metallic glass composite containing 6.4 B-32.6 N (in at.%) with optima hardness, 16.2 GPa, adequate indentation toughness and excellent adhesion quality was achieved in this work.
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