Made by sol-gel reaction of silica used in metal surface of the substrate for release film

• Main Authors: Chun-Yen Kuo, 郭俊彥
• Other Authors: 程耀毅
• Format: Others
• Language: zh-TW
• Published: 2013
• Online Access: http://ndltd.ncl.edu.tw/handle/92s5rq

碩士 === 國立臺北科技大學 === 有機高分子研究所 === 101 === Silica is a nanostructured, highly porous solid. that present properties, Silica has superior properties, such as, extremely low densities, low thermal conductivity and high surface area. The purpose of this study is to use sol-gel method to synthesize silica thin film and to compare the influence of the solvents using in this process. The result has indicated that the gelation time is greatly increased, when isopropanol / TEOS mole ratio greater than 2. Sol-gel thin film is formed on metal substrates by dip coating and drying in oven. Using couping agent to enhance the bonding between SiO2 film and metal substrates was studied. The properties of the prepared film were studied including thermal properties, morphology, planarity, thickness, and its dispersion, absorption, and harness. This study utilized many analytical instruments, including SEM, AFM, and contact angle measment tool. The SEM results, the particles size and surface structure were observed. The SEM images show that silica particle have diameter of nano meter scale.