Study of electrodeposition of CuAlSe2 and Cu(In,Al)Se2 thin films with triethanolamine as the complexing agent

碩士 === 國立成功大學 === 化學系 === 102 === In our experiments, CAS and CIAS were deposited on ITO glass from chloride electrolytes by the method of co-electrodeposition. The parameters include: individual ion concentration, annealing temperature and annealing time, TEA concentration, deposition potential and...

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Main Authors: Chien-TingChen, 陳建廷
Other Authors: Thou-Jen Whang
Format: Others
Language:zh-TW
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/9cvb96
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spelling ndltd-TW-102NCKU50650082019-05-15T21:42:45Z http://ndltd.ncl.edu.tw/handle/9cvb96 Study of electrodeposition of CuAlSe2 and Cu(In,Al)Se2 thin films with triethanolamine as the complexing agent 使用三乙醇胺作為錯合劑電沉積二硒化銅鋁、銅銦鋁硒薄膜之研究 Chien-TingChen 陳建廷 碩士 國立成功大學 化學系 102 In our experiments, CAS and CIAS were deposited on ITO glass from chloride electrolytes by the method of co-electrodeposition. The parameters include: individual ion concentration, annealing temperature and annealing time, TEA concentration, deposition potential and deposition time. Among all conditions, the optimum condition was 5 mM CuCl2 + 30 mM AlCl3 + 22 mM SeO2 + 0.2 M TEA deposited at pH 2.50 and then under annealing at 300 °C for 1.0 hr. Current density, particle size, thickness and band gap were found to be affected by the deposition potential. The crystal structure, compositions and morphologies of the deposited thin films were determined by X-ray powder diffractometer, energy dispersive spectrometer and scanning electron microscope, respectively. X-ray diffraction patterns revealed the peak intensities of the deposits were altered when the parameters mentioned above changed. From the analysis of EDS, the atomic ratios of Se in the films of deposits were discovered lower than the stoichiometric ratio. This phenomenon would narrow down the band gap, which can be calculated from formulas. To investigate the optical properties, transmittance and reflectance of the films could be examined by UV-VIS-NIR-Spectrophotometer, and it would cause different absorption coefficients which were calculated from formulas. Overall, the absorption coefficient of the deposited films was as high as 104 cm-1, demonstrates that the films are potential absorbing materials because it possesses strong sunlight-absorbing characteristics. Thou-Jen Whang 黃守仁 2014 學位論文 ; thesis 94 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立成功大學 === 化學系 === 102 === In our experiments, CAS and CIAS were deposited on ITO glass from chloride electrolytes by the method of co-electrodeposition. The parameters include: individual ion concentration, annealing temperature and annealing time, TEA concentration, deposition potential and deposition time. Among all conditions, the optimum condition was 5 mM CuCl2 + 30 mM AlCl3 + 22 mM SeO2 + 0.2 M TEA deposited at pH 2.50 and then under annealing at 300 °C for 1.0 hr. Current density, particle size, thickness and band gap were found to be affected by the deposition potential. The crystal structure, compositions and morphologies of the deposited thin films were determined by X-ray powder diffractometer, energy dispersive spectrometer and scanning electron microscope, respectively. X-ray diffraction patterns revealed the peak intensities of the deposits were altered when the parameters mentioned above changed. From the analysis of EDS, the atomic ratios of Se in the films of deposits were discovered lower than the stoichiometric ratio. This phenomenon would narrow down the band gap, which can be calculated from formulas. To investigate the optical properties, transmittance and reflectance of the films could be examined by UV-VIS-NIR-Spectrophotometer, and it would cause different absorption coefficients which were calculated from formulas. Overall, the absorption coefficient of the deposited films was as high as 104 cm-1, demonstrates that the films are potential absorbing materials because it possesses strong sunlight-absorbing characteristics.
author2 Thou-Jen Whang
author_facet Thou-Jen Whang
Chien-TingChen
陳建廷
author Chien-TingChen
陳建廷
spellingShingle Chien-TingChen
陳建廷
Study of electrodeposition of CuAlSe2 and Cu(In,Al)Se2 thin films with triethanolamine as the complexing agent
author_sort Chien-TingChen
title Study of electrodeposition of CuAlSe2 and Cu(In,Al)Se2 thin films with triethanolamine as the complexing agent
title_short Study of electrodeposition of CuAlSe2 and Cu(In,Al)Se2 thin films with triethanolamine as the complexing agent
title_full Study of electrodeposition of CuAlSe2 and Cu(In,Al)Se2 thin films with triethanolamine as the complexing agent
title_fullStr Study of electrodeposition of CuAlSe2 and Cu(In,Al)Se2 thin films with triethanolamine as the complexing agent
title_full_unstemmed Study of electrodeposition of CuAlSe2 and Cu(In,Al)Se2 thin films with triethanolamine as the complexing agent
title_sort study of electrodeposition of cualse2 and cu(in,al)se2 thin films with triethanolamine as the complexing agent
publishDate 2014
url http://ndltd.ncl.edu.tw/handle/9cvb96
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