System development and contour analysis for pulsed laser engraving with inclination angles
碩士 === 國立成功大學 === 機械工程學系 === 102 === The aim of this research is to analyze the laser engraving contour and its relations with the controlling parameters such as overlap ratio, inclination angle and the absorption coefficient of substrate. A theoretical model was applied to simulate the hole contour...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/c35yhk |
| Summary: | 碩士 === 國立成功大學 === 機械工程學系 === 102 === The aim of this research is to analyze the laser engraving contour and its relations with the controlling parameters such as overlap ratio, inclination angle and the absorption coefficient of substrate. A theoretical model was applied to simulate the hole contour with the key factors to affect the engraving profile. The experimental results were compared with the simulations, and it shows that the theoretical model is in a good agreement with the experimental results.
The simulation is based on the theoretical model developed previously. The laser energy distribution was calculated and modified with the engraving depth. By combining the absorption and material removal effects on the inclined surface, the engraving profiles were simulated for a graphite substrate.
The experiment was carried out by using a pulsed Nd-YAG laser and graphite substrate. An optical fiber was connected to a beam splitter with a focusing lens and a CCD camera. A CNC platform was used to achieve micro step engraving in 3D coordinates.
The theoretical model is well developed to analyze the three dimensional laser engraving contour with an acceptable accuracy in the present study. The laser engraving system developed in the research shows that it can be used to engrave material at high precision. Both experiment and simulation results show the overlap ratio and the inclination angle are the key factors to the 3D engraving contours.
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