Research on Uniformity Improvement for chemical vapor deposition in TFT-LCD
碩士 === 國立交通大學 === 平面顯示技術碩士學位學程 === 102 === In this thesis, we discussed with the characteristics of amorphous Silicon (a-Si) thin film deposition in PECVD equipment by different process conditions. Four input parameters (RF power, chamber pressure, the upper electrode plate holes, upper and lower el...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/apjdtq |